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Vacuum Deposition System from Moorfield Nanotechnology, UK

Physical Vapour Deposition (PVD) , Chemical Vapour Deposition (CVD)

Evaporation, Soft-etching, Annealing (Thermal Processing), Electron microscopy coating

진공증착시스템 (Vacuum Deposition System)

MiniLab 090 Thermal evaporation, LTE, E-beam evaporation, Magnetron sputtering system

 
MiniLab 090 시스템은 글로브박스와 호환됩니다. MiniLab 090은 깊이있는 긴 챔버를 사용하므로 고성능 증착 (high-performance evaporation)에 이상적이며, 동시에 마그네트론 스퍼터링(magnetron sputtering)에 사용할 수 있습니다.

 

Techniques:

Thermal evaporation, Low-temperature thermal evaporation (LTE), E-beam evaporation, Magnetron sputtering


MiniLab 090 시스템은 금속 및 유전체, 유기물 증착을 위한 floor-standing PVD  증착장비입니다. 모든 시스템에는 글로브박스를 위한 전,후면 도어를 갖는 박스형 스테인리스 스틸 챔버가 포함되어 있습니다. (글러브박스를 통한 외부 서비스 접근이 가능합니다).

챔버는 종횡비율이 높은 긴 working distance를 통해 증착 기술을 통한 균일한 코팅이 가능하고, 마그네트론 스퍼터링이 장착될 수도 있습니다. 5 × 10-7 mbar 이상의 고진공을 위해 기본적으로 터보펌프 시스템을 사용합니다. 매우 유연하고, 고객 예산과 애플리케이션에 따라 정확한 구성이 가능합니다. 시스템은 수동의 thermal evaporation system에서 완전 자동화된 process control 성능을 갖는 멀티 테크닉 장비에 이르기까지 다양하게 구성됩니다.

 

MiniLab 090

Key features

  • Modular design
  • Front sliding door for in-glovebox loading
  • Rear door for service access
  • Turbomolecular or cryo pumping systems
  • Base pressures <5 × 10-7 mbar
  • Metals, dielectrics and organics deposition
  • Up to 11” diameter substrates
  • Touchscreen HMI/PC for system control
  • Equipped for easy servicing
  • Comprehensive safety features and interlocks
  • Cleanroom compatible

 

Options

  • Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps.
  • Gas/pressure: Manual or automatic control via MFCs and throttle valves.
  • Load-locks: Single- and multiple-sample.
  • Stages: Rotation, heating, cooling, Z-shift, bias and planetary.
  • Shutters: Source and substrate, pneumatic or motorised.
  • Operation: Manual or automatic via front panels, touchscreen HMI or PC.
  • Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control.

 

Typical configurations

Thermal evaporation (metals):
Four-source TE4 thermal evaporation component with source shutters and rotation stage. High power TEC-4A power supply and controller with recipe-based automated control. Quartz crystal sensor head with PC software for rate/thickness monitoring.

Thermal evaporation (metals and organics):
Two TE1 thermal evaporation sources for metals and four LTE-1CC components for organics. Source shutters and rotation stage. Evaporation power supplies linked to quartz crystal sensor head and Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.

E-beam evaporation:
Multi-pocket (e.g., 6 × 7 cc or 8 × 4 cc) water-cooled e-beam source with 5 kW power supply/controller and automated pocket selection. Source and substrate shutters, and rotation. Quartz crystal sensor heads with Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.

Magnetron sputtering:
Up to four water-cooled magnetron sources for 3″ circular targets. RF and DC power supplies with SputterSwitch technology for shared outputs. Source shutters and substrate rotation. Recipe-based power vs. time process control.Magnetron sputtering sources can be added alongside the above techniques.

 

 

 

 

 


 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

MiniLab 090 Thermal evaporation, LTE, E-beam evaporation, Magnetron sputtering

MiniLab 090 systems are glovebox-compatible for atmosphere-sensitive applications. Tall chambers are ideal for high-performance evaporation, but magnetron sputtering is also available. 
MiniLab 090 systems are floor-standing PVD tools for metals, dielectrics and/or organics deposition. All systems contain a box-type stainless-steel chamber with front and rear doors for glovebox integration (allows for both through-glovebox and external service access).
The chamber has a high aspect-ratio, ideal for long working distances for high uniformity coating via evaporative techniques, but systems can also be equipped with magnetron sputtering. A turbomolecular pumping system is standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. Exact configuration is extremely flexible and dependent on customer budgets and applications. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully-automated process control.

 

Service requirements

All MiniLab 090 tools require chilled water, dry compressed air, nitrogen for venting (optional) and electrical power (three-phase for e-beam evaporation). Sputtering systems also require process gases (argon, oxygen and nitrogen). Exact requirements will be provided with quotations or on request.

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