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Vacuum Deposition System from Moorfield Nanotechnology, UK

Physical Vapour Deposition (PVD) , Chemical Vapour Deposition (CVD)

Evaporation, Soft-etching, Annealing (Thermal Processing), Electron microscopy coating

진공증착시스템 (Vacuum Deposition System)

MiniLab 125 Thermal evaporation, LTE, E-beam evaporation, Magnetron sputtering system

 
MiniLab 125는 modular concept의 pilot-scale 시스템입니다. 대형 챔버를 사용하여 넓은 영역을 코팅하도록 부속품 세트를 크게 늘릴 수 있으며, 다양한 load-lock  옵션을 통해 높은 처리량의 작업이 가능합니다. 동시에 본 시스템은 사용자 어플리케이션에 맞추는 완벽한 customize가 지원됩니다. 

 

MiniLab 125

Techniques:

Thermal evaporation, Low-temperature thermal evaporation (LTE), E-beam evaporation, Magnetron sputtering


MiniLab 125 시스템은 금속과 유전체, 유기물의 박막 증착을 위한 floor-standing vacuum evaporator입니다. 모든 시스템에는 로딩/언로딩을 위한 전면 도어를 갖는 박스형 스테인리스 스틸 챔버를 포함하고 있습니다. 챔버 체적이 클수록 파일럿 스케일의 코팅을 위한 대형 소스 또는 유연한 연구개발을 위한 복합적인 기술이 사용됩니다. 시스템은 특정 기판에 맞춤 디자인되는 주요 증착 기술이 적용됩니다.

Turbo 펌프 시스템에 의한 5 × 10-7 mbar 이상의 고진공 압력을 기본으로, 고객의 예산 및 어플리케이션에 따라 정확한 구축이 가능합니다.

 

Key features

  • Modular design
  • Front sliding door for in-glovebox loading
  • Rear door for service access
  • Turbomolecular or cryo-pumping systems
  • Base pressures <5 × 10-7 mbar
  • Metals, dielectrics and organics deposition
  • Up to 11” diameter substrates
  • Touchscreen HMI/PC for system control
  • Equipped for easy servicing
  • Comprehensive safety features and interlocks
  • Cleanroom compatible

 

Options

  • Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps.
  • Gas/pressure: Manual or automatic control via MFCs and throttle valves.
  • Load-locks: Single- and multiple-sample.
  • Stages: Rotation, heating, cooling, Z-shift, bias and planetary.
  • Shutters: Source and substrate, pneumatic or motorised.
  • Operation: Manual or automatic via front panels, touchscreen HMI or PC.
  • Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control.

 

Typical configurations

Thermal evaporation (metals):
Four-source TE4 thermal evaporation component with source shutters and rotation stage. High power TEC-4A power supply and controller with recipe-based automated control. Quartz crystal sensor head with PC software for rate/thickness monitoring.

Thermal evaporation (metals and organics)
Two TE1 thermal evaporation sources for metals and four LTE-1CC components for organics. Source shutters and rotation stage. Evaporation power supplies linked to quartz crystal sensor head and Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.

E-beam evaporation
Multi-pocket (e.g., 6 × 7 cc or 8 × 4 cc) water-cooled e-beam source with 5 kW power supply/controller and automated pocket selection. Source and substrate shutters, and rotation. Quartz crystal sensor heads with Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.

Magnetron sputtering
Up to four water-cooled magnetron sources for 3″ circular targets. RF and DC power supplies with SputterSwitch technology for shared outputs. Source shutters and substrate rotation. Recipe-based power vs. time process control. Magnetron sputtering sources can be added alongside the above techniques.

 

 

 

 

 

 

 


 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

MiniLab 125 Thermal evaporation, LTE, E-beam evaporation, Magnetron sputtering system

MiniLab 125 tools take the modular concept to the pilot-scale level. Large chambers allow for increased-size component sets for coating large areas, and a range of load-lock options enable high-throughput operation. At the same time, systems are fully customisable to match specific applications.
MiniLab 125 systems are floor-standing vacuum evaporators for metal, dielectric and/or organics thin-film deposition. All systems contain a box-type stainless-steel chamber with a front door for loading/unloading. Large chamber volumes enable large sources for pilot-scale coating or multiple techniques for a flexible R&D tool. Systems are available fitted with all major deposition techniques and stages customised to specific substrates.
Turbomolecular pumping systems are standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. Exact setup is extremely flexible and dependent on customer budget and applications.

 

 

Service requirements

All MiniLab 125 tools require chilled water, dry compressed air, nitrogen for venting (optional) and electrical power (three-phase for e-beam evaporation). Sputtering systems also require process gases (argon, oxygen and nitrogen). Exact requirements will be provided with quotations or on request.

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