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Vacuum Deposition System from Moorfield Nanotechnology, UK

Physical Vapour Deposition (PVD) , Chemical Vapour Deposition (CVD)

Evaporation, Soft-etching, Annealing (Thermal Processing), Electron microscopy coating

진공증착시스템 (Vacuum Deposition System)

nanoPVD-T15A, Low Temperature Thermal Evaporation

Moorfield의 nanoPVD 제품군 중 최신 모델인 T15A 모델은 유기물 및 금속 증착을 위한 저온 증발(LTE) 및 standard resistive evaporation source를 각각 장착할 수 있습니다. 우수하고 효율적인 성능으로 OLED, OPV 및 OFET의 고성능 금속, 벤치탑 패키지의 유기 증착 연구에 이상적입니다.

 


Techniques:

Thermal evaporation

 

LTE sources are low thermal-mass for better control when evaporating volatile organic materials, while metals sources are our box-shielded TE1 models for efficient deposition and reduced cross-contamination.

Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter. The chamber is tall, allowing for high-uniformity coating via evaporative techniques.

The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.

With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-T15A is a versatile, efficient solution for world-class R&D applications.

 

Key features

  • Benchtop configuration
  • Organics and metals evaporation sources
  • High aspect-ratio chamber for uniform coating
  • Fully automatic operation via touchscreen HMI
  • Define/save multiple process recipes
  • Up to 4” diameter substrates
  • Base pressures <5 × 10-7 mbar
  • Equipped for easy servicing
  • Comprehensive safety features
  • Proven performance

 

Options

  • Dry backing pump
  • Fast chamber vent
  • Automatic high-resolution pressure control
  • Up to 4 LTE sources for organics
  • Up to 2 evaporation sources for metals
  • 500 °C substrate heating stage
  • Substrate rotation, Z-shift and shutters
  • Quartz crystal sensor head

 

 

Typical configurations

Metals deposition
Two thermal evaporation sources for metals evaporation with shutters and quartz crystal sensor head for rate/thickness calibration.

Organics deposition
Four LTE sources for organics deposition with shutters and quartz crystal sensor head for rate/thickness calibration.

Metals and organics deposition
Two thermal evaporation sources and two LTE sources for metals and organics PVD, with shutters and quartz crystal sensor head.

 

Service requirements

All nanoPVD-T15A systems require chilled water, dry compressed air, nitrogen for venting (optional) and electrical power. Exact requirements will be provided with quotations or on request.

 

nanoPVD-T15A Low Temperature Thermal Evaporation

The latest model in Moorfield’s nanoPVD range, model T15A can be equipped with low-temperature evaporation (LTE) and standard resistive evaporation sources for deposition of organics and metals, respectively. High-performance metals, organic evaporation in compact packages for benchtop location. Superior, efficient performance and ideal for OLED, OPV and OFET research.


 

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