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· ¿ºÐ¼® Àü¹®°¡¿¡ ÀÇÇÑ ¿ºÐ¼®
ÃøÁ¤ µ¥ÀÌÅÍÀÇ ¸íÄèÇÑ
ÇØ¼® ! · Á¤È®Çϰí ÀçÇö¼º ÀÖ´Â °íǰÁúÀÇ ±â±â¿Í ÀÀ¿ë¼ÒÇÁÆ®¿þ¾î¸¦ ÀÌ¿ëÇÑ
´Ù¾çÇÑ ºÐ¼®¼ºñ½º Á¦°ø. · Àç·á
¹°¼º¿¡ µû¸¥ ÃÖÀûÀÇ method °³¹ß ¹× Á¦°ø. · º¸°í¼,
±×¸²ÆÄÀÏ, raw data (ASCII file)Á¦°ø.
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½ÃÂ÷Áֻ翷®°è
(DSC)
ºÐ¼®¼ºñ½º · Glass transition temperature (À¯¸®ÀüÀ̿µµ, Tg)
· Specific heat capacity (ºñ¿, Cp)
· Temperature of fusion (¿ëÀ¶Á¡, Tm),
Heat of fusion (¿ëÀ¶¿, ¥ÄH) · Latent heat (Àá¿),
Fraction melted · Crystallinity, degree of crystallization (°áÁ¤Èµµ)
·
Temperature of crystallization (°áÁ¤È ¿Âµµ, Tc)
· Heat of crystallization (°áÁ¤È¿, ¥ÄH), Cold crystallization (Àç°áÁ¤È)
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· Chemical reaction (ÈÇйÝÀÀ),
Curing
(°æÈ), degree of cure (°æÈµµ, ¥á), °æÈ¿ (¥ÄH), post-curing
· Polymorphism (change of crystal modification), mesophase
transition, solid-solid transition
· Evaporation, desorptioon (moisture), vaporization, sublimation
· Thermal decompostion (pyrolysis, depolymerization),
Thermal stability (¿¾ÈÁ¤¼º) · Lambda
transition and more
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-
DSC Temperature range: -65°C ~ 700°C -
Heating rate: 0.001 ~ 200 K/min - Purge
gas: Air, N2(Nitrogen), O2 (Oxygen) and Argon(Ar)
gas available by static or dynamic flow
- Temperature program: Dynamic, Isothermal,
Iso-Dyn-Iso Multistep and TM DSC (Sinusoidal)
¢Ñ ¿Âµµº¯Á¶DSC(TMDSC),
Sapphire Mehtod Cp
(DIN 51007), ¹ÝÀÀ¼Óµµ (Kintics),
DSC Purity,
»êȵµÀÔ±â(OIT),
IsoStep(TM), ASCII
fileÀÇ DSC-TGA-TMA-DMA-MS -FTIR ÃøÁ¤
µ¥ÀÌÅÍ evaluation
µî °í±ÞºÐ¼®
°¡´É
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ÀçÁúºÐ¼®±â
ºÐ¼®¼ºñ½º
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·Á¡Âø·Â
ÃøÁ¤ (Tack test) - Ball tack, Peel-Off
test, Loop tack ·Á¢Âø·Â
ÃøÁ¤ (Adhesion test) ·½Äǰ¹°¼º
ºÐ¼® (TPA test) ·ÀçÁúºÐ¼®
(Texture analysis) ·Á¡Åº¼º
Ư¼º ºÐ¼® (Visco-elestic properties) ·ÀÎÀå½ÃÇè
(Tension) ·¾ÐÃà°µµ
½ÃÇè (Compression) ·Å©¸®ÇÁ
½ÃÇè (Creep test) *
°íÁ¤ ÇÏÁß¿¡¼ º¯À§(deformation)ÀÇ Áõ°¡
ÃøÁ¤ ·ÀÀ·Â¿ÏÈ
°Åµ¿ ½ÃÇè (Stress relaxation) *
°íÁ¤ º¯À§¿¡¼ ÇÏÁß(load) ¶Ç´Â ÀÀ·ÂÀÇ
°¨¼Ò ÃøÁ¤ ·Strain
- Stress curve ·Shear
strength ·Flexure
(3-point bending) and more |

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¿Àüµµµµ
¹× ¿ÀúÇ×, ¿È®»êÀ²
ºÐ¼®¼ºñ½º
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·
Steady
state Heat Flow Method (ASTM E 1530) ·
Thermal
conductivity (0.1 ~ 20 W/mK) ·
Thermal
resistance (0.0002 ~ 0.1 m2K/W)
-
Polymer resin, Thin film, Composites,
Ceramic, Metal
-
RT (steady state)
-
0.1 ~ 20 W/mK (thermal conductivity)
-
0 ~ 100 psi (load) - 2 inch (50.8mm)
diameter round specimen - 0.1mm ~
2.54mm thickness specimen
·
Laser
Flash Method (ASTM E 1461) -
RT
~ 300 °C -
0.1 ~ 2000 W/mK (thermal conductivity)
-
0.001 to 10 §²/s (thermal Diffusivity)
-
Specific heat capacity
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See
also
TGA,
TMA, DMA ºÐ¼®¼ºñ½º
¡é(click
here)
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¿Áß·®ºÐ¼®±â
(TGA)
ºÐ¼®¼ºñ½º RT
~ 1600 °C (TGA/DSC) ·
Á¶¼º¿¡
µû¸¥ Áú·®ÀÇ Áõ°¨ ÃøÁ¤ ·
Evaporation,
desorptioon (moisture),
vaporization · Thermal
decompostion (pyrolysis,
depolymerization) ·
Thermal
stability (¿¾ÈÁ¤¼º) ·
Oxidative
degradation, oxidation
stability (»êȾÈÁ¤¼º) ·
Compositional
analysis (volatiles,
polymer, carbon black,
ash, filler, glass fibers) ·
DTA
application with TGA/DTA,
e.g. Solid-solid transition ·
DSC
application with TGA/DSC,
STA
and more
¿±â°èºÐ¼®±â
(TMA)
ºÐ¼®¼ºñ½º -150°C
~ 600 °C (Low Temp.), RT ~ 1100 °C (High
Temp.) ·Å©±â(Ä¡¼ö)
º¯È (dimensional change)
ÃøÁ¤ ·Expansion and
shrinkage behavior (ÆØÃ¢
¹× ¼öÃà °Åµ¿) · Expansivity
(Coefficient of linear
expansion) · Coefficient
of Thermal Expansion
(¿ÆØÃ¢ °è¼ö, CTE) ·Young's
shear modulus, stiffness ·Polymorphism
(change of crystal modification) ·
Glass
transition (À¯¸®ÀüÀÌ,
Tg) · Softening (¿¬ÈÁ¡) ·
Thermal
decompostion (pyrolysis,
depolymerization) ·
Thermal
stability (¿¾ÈÁ¤¼º) ·
Oxidative
degradation, oxidation
stability (»êȾÈÁ¤¼º) ·
Temperature
of fusion (¿ëÀ¶Á¡, Tm) ·
Melting
behavior, fraction melted (¿ëÀ¶°Åµ¿) ·
Cold
crystallization (Àç°áÁ¤È)
... more
µ¿Àû±â°èºÐ¼®±â
(DMA)
ºÐ¼®¼ºñ½º -150°C
~ 500
°C,
0.001
~ 200
Hz,
0.01
~ 20
N -
Á¡Åº¼ºÀû
ź¼ºµµ (Viscoelastic
Modulus)ÃøÁ¤ - Ageing
(³ëÈÄ Å×½ºÆ®) - Bending test
(±¼°î½ÃÇè) - Compliance (J*) -
Compression test
(¾ÐÃàÇÏÁß ½ÃÇè) -
Correlation
avec chock - Correlation with acoustic performances - Correlation with
materials formulation - Correlation with products performances -
Creep
behavior, Creep test - Curing kinetics, Curing time - Degree of
reticulation - Dimensional stability - Dynamic test - Dynamic viscosity
(h*) - Fatigue test - Gel time - Glass transition temperature
(À¯¸®ÀüÀ̿µµ, Tg) -
Humidity sensitivity -
Impact resistance -
Industrial products
stiffness - Linear/Non-linear behavior (¼±Çü/ºñ¼±ÇüÀû °Åµ¿) - Damping, Loss angle (delta),
Loss factor (¼Õ½Ç°è¼ö,
tan
¥ä) - Mechanical properties
(±â°èÀû Ư¼º) - Melting point
(¿ëÀ¶Á¡, Tm) - Morphology of
polymers (°íºÐÀÚ ÇüÅÂÇÐ) - Optimization of curing
process (°æÈ°úÁ¤ÀÇ ÃÖÀûÈ °Ë»ç) - Penetrometry test - Polymer compatibility -
Prediction of long
term mechanical behaviour - Relationships mechanical properties/molecular
structure - Relaxation time - Reticulation follow up - Rheological
properties - Secondary transitions - Shear modulus (G*) -
Shear
test - Specimen stiffness - Stress relaxation test - Tension test -
Thermal
properties - Thermal stability - UV sensivity - Viscoelastic properties
- Young Modulus E* - Storage Modulus (ÀúÀåź¼ºÀ², E', G') -
Loss
Modulus (¼Õ½Ç½Çź¼ºÀ²,
E",
G")
...
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TGA,
TMA,
DMA
ºÐ¼®¼ºñ½º
»ó¼¼
³»¿ª

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· ¿ºÐ¼® ¹×
¿¹°¼º ºÐ¼®ÀÇ
ÃÖ°í¸¦ ÁöÇâÇÕ´Ï´Ù.
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ÀüÀÚÀç·á¹°¼º ºÐ¼® ¹× µð½ºÇ÷¹À̼ÒÀÚ ºÐ¼®¼ºñ½º
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PL/EL Spectrometor
Ãâ»ç±¤ÀÇ ½ºÆåÆ®·³ Ư¼º ÃøÁ¤
ÃøÁ¤ÆÄÀå¹üÀ§ : 250~1000nm
ÆÄÀå ºÐÇØ´É : 0.2nm
step size : 0.05nm
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C-V, I-V ÃøÁ¤ÀåÄ¡
2 Channel I-V ÃøÁ¤ ÀåÄ¡
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ºÐ±¤±¤µµ°è
UV/VIS/NIR ¿µ¿ª (175 nm~3300 nm)¿¡¼ Çʸ§ÀÇ ¹Ý»çÀ² ¹× Åõ°úÀ² ÃøÁ¤
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OLED¼ö¸í ÃøÁ¤ÀåÄ¡
OLEDÀÇ °¡Àå Áß¿ä ¿ä¼ÒÁß ÇϳªÀÎ ¹ß±¤ ¼ö¸íÀÇ ÃøÁ¤°ú º¯È ÃßÀÌ °üÃø °¡´É
- À¯±â EL ÆÐ³Î Àü±âÀû Ư¼º½ÃÇè, ´Ùä³Î OLED Test Cell ±¸µ¿ ¹× ¼ö¸í ½ÃÇèÆò°¡½ÃÇè ¸ðµå¿¡¼ ´Ùä³Î µ¿½Ã ±¸µ¿ ¹× Àü¾Ð/Àü·ù ÃøÁ¤
- ͏®ºê·¹ÀÌ¼ÇµÈ Si-Photodiode¸¦ ÀÌ¿ëÇÑ ´Ùä³Î ÈÖµµ µ¿½Ã ÃøÁ¤
- ÈÖµµ °¨¼Ò ÇÏÇÑ ¶Ç´Â Àü¾Ð Áõ°¡ »óÇÑ¿¡ µû¸¥ ¼ö¸í °áÁ¤
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¿¿µ»óºÐ¼®±â
32¹è ÀÌ»óÀÇ ÀüÀÚÁÜ (digital zoom) ±â´É Á¦°ø, ¹ÌÄ¿¿¡ ´ëÇÏ¿© ÃøÁ¤ ÀڷḦ ±×·¡ÇÁ·Î Á¦°ø, ÃøÁ¤ µ¥ÀÌÅ͸¦ ½Ç½Ã°£À¸·Î µð½ºÅ©ÆÄÀÏ ÀúÀå, ÀԷ¿µ»ó¿¡ ´ëÇÏ¿© ¿µ»ó ĸó ±â´É Á¦°ø, ½º³À¼¦ ¿µ»ó ¸ñ·Ï¿¡ ´ëÇÏ¿© ÀúÀå ±â´É Á¦°ø
- ¿ÂµµºÐÆ÷¸¦ Ä®¶ó¿µ»ó (pseudo color) À¸·Î ó¸®
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¿Àüµµµµ ÃøÁ¤±â
¾î¶² ¹°ÁúÀÇ Àüµµ¼º(conduction)¿¡ ÀÇÇØ ¿ÀÌ Àü´Þ (heat propagation) µÇ´Â ¼Óµµ¸¦ ½Ã°£¿¡ ´ëÇÑ ¿Âµµ º¯È·Î½á °áÁ¤ÇÏ´Â ¿¹°¼ºÀ¸·Î½á °íºÐÀÚ ¹× ±Ý¼Ó, ¼¼¶ó¹Í, º¹ÇÕÀç·á, À¯¸®, °í¹«, ¾×ü, ºÐ¸»½Ã·á µîÀÇ ¿Àü´Þ°úÁ¤À» ÀÌÇØÇϴµ¥ ¸Å¿ì À¯¿ëÇÑ ¹°¼ºÄ¡ À̸ç À̸¦ ÃøÁ¤ ºÐ¼®ÇÏ´Â ±â±â
- µð½ºÇ÷¹ÀÌ ¼ÒÀçÀÇ ¿Àû Ư¼º ºÐ¼®
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ºÐ±¤Åõ°ú / ¹Ý»çÀ²°è
¹Ý»çÀ², Åõ°úÀ² ÃøÁ¤, Wavelength range : 190~1100nm
- ƯÁ¤ ÆÄÀ念¿ªÀÇ ¹Ý»çÀ², Åõ°úÀ² ÃøÁ¤
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½ºÆÑÆ®·Î¶óµð¾î ¸ÞÅÍ
¾Ï»óÀÚ¿¡¼ OLED¼ÒÀÚ¸¦ Áö±×¿¡ ¹°·Á³Ö°í µðÁöÅмҽº¹ÌÅÍ, ÆÞ½º¼Ò½º¹ÌÅÍ·Î Àü¾Ð ¶Ç´Â Àü·ù¸¦ Àΰ¡ÇÏ¿© ¼ÒÀÚÀÇ ¹ß±¤ Ư¼ºÀ» ºÐ¼® I-V-L ÃøÁ¤¿ë Áö±×, ¼ö¸íÃøÁ¤¿ë Áö±×
- OLED¼ÒÀÚÀÇ Àü·ù-Àü¾Ð ½ºÆåÆ®·³, »öÁÂÇ¥, ÈÖµµ, Àü·ùÈ¿À²,
¿ÜºÎ¾çÀÚÈ¿À², »ö¿Âµµ µîÀ» ÃøÁ¤
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Wet station system
°¢Á¾ ¼ÒÀÚ °øÁ¤½Ã ÇÊ¿äÇÑ ¼¼Ã´ ¶Ç´Â ½Ä°¢ °øÁ¤À» Çϱâ À§ÇÑ ¹è½º °¢Á¾
Etch °øÁ¤, Strip & Develop °øÁ¤ ¼öÇà Wafer, Glass cle
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¹Ú¸·ÁõÂø±â
¾ÆÅ©¸± ¼öÁö ¹× ±âŸ Æú¸®¸Ó¿¡ ÄÚÆÃÀÌ °¡´ÉÇϵµ·Ï Àú¿ÂÆ®·¦À» ¼³Ä¡ ¸·ÁúÀÇ ¼º´É Çâ»óÀ» À§ÇÑ Ion Beam GunÀÌ ÀåÂø
- ±Ý¼Ó»Ó ¾Æ´Ï¶ó °¢Á¾ ±Ý¼Ó »êȹ°µéÀÇ ¹Ú¸· ÁõÂøÀÌ °¡´ÉÇÑ Àåºñ
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OLED¼ÒÀÚÁ¦ÀÛ ¹× ÆÐŰ¡ Àåºñ
OLED¼ÒÀÚ¸¦ Á¦ÀÛÇÏ´Â Áú¼ÒºÐÀ§±âÀÇ ±Û·Îºê ¹Ú½º¿¡¼ ÆÐŰ¡ÇÏ´Â Àåºñ
- À¯±â¹° è¹ö, ±Ý¼Óè¹ö, ÄÁÆ®·Ñ ÆÐ³Î, ±Û·Îºê¹Ú½º·Î ±¸¼º.
- À¯±â¹°Ã¨¹ö¿¡´Â 5°³ÀÇ Áõ¹ß¿ø, ±Ý¼Óè¹ö¿¡´Â 3°³ÀÇ Áõ¹ß¿ø ÀÖÀ½.
- ±Û·Îºê¹Ú½º´Â ¼öºÐ, »ê¼Ò¸¦ 1ppm ÀÌÇÏ·Î À¯Áö½ÃÅ´.
- OLED¼ÒÀÚ Á¦ÀÛ ¹× ÆÐŰ¡
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3Â÷¿ø ¹Ì¼¼Ç¥¸é Çü»ó ÃøÁ¤±â (3D Surface profiler)
ºñÁ¢Ã˽ÄÀ¸·Î ³ª³ë¹ÌÅÍ »çÀÌÁîÀÇ 3Â÷¿ø Ç¥¸éÇü»óÀ» ¹é»ö±¤ °£¼·°è¸¦ ÀÌ¿ë ÇÏ¿© °íÁ¤µµ, °í¼ÓÀ¸·Î ÃøÁ¤ÀÌ °¡´ÉÇÑ Àåºñ
- ±í ÀÌ ÃÖ´ë 180 um ±îÁö
- ¸é Àû 1.28mm ~ 0.64mm
- Ãø Á¤ ¼Ó µµ 2 § /sec ~ 5 § /sec
- ÃøÁ¤ ºÐÇØ´É 0.5 nm (¼öÁ÷ ºÐÇØ´É)
- ¹Ýº¹ Á¤¹Ðµµ 0.5% ÀÌÇÏ (NIST Ç¥ÁØ½ÃÆí ±âÁØ)
- TFT-LCD,BLU, PDP, OLEDµî ÆòÆÇÇ¥½Ã¼ÒÀÚÀÇ ¹Ì¼¼Çü»ó ¹× °ÅÄ¥±â ÃøÁ¤
- µð½ºÇ÷¹ÀÌ ¹Ú¸·ÀÇ ´ÜÂ÷ ¹× Ç¥¸é Çü»ó ÃøÁ¤ µî
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ÀÌ¿ÂÄÚÅÍ (Ion Coater)
ÇöóÁ¸¦ »ý¼ºÇÏ¿© ±Ý¼Ó¹Ú¸·À» Çü¼º½ÃŰ´Â Àåºñ
- µµ±ÝÁ¶, Àü±Ø
- 1ph 220V / 60Hz : DC 15V 20A
- Pulse time : 0.1 ~ 100ms
- On/off pulse
- ¹é±Ý, ±Ý¼Ó¹Ú¸·ÀÇ ÄÚÆÃ
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Ellipsometry
´ÜÀÏÆÄÀåÀÇ ºûÀ» ÀÌ¿ëÇÏ¿© ¹Ú¸·ÀÇ Ç¥¸é¿¡ ÀÔ»ç½ÃÄ×À» ¶§, ±¼Àý°ú ¹Ý»çµÇ´Â ºûÀ» °ËÃâÇÏ¿© ¹Ú¸·ÀÇ µÎ²²¸¦ ÃøÁ¤
- Bulk Measurement : ±¼Àý·ü Á¤È®µµ ± 0.001
- Refractive Index Only : ±¼Àý·ü ºÐÇØ´É ± 0.000
- VAMFO for Thick Film : µÎ²² ÃøÁ¤ ¹üÀ§ 12§ ~150 §
- »ó¿Â, »ó¾Ð¿¡¼ ¹Ú¸·ÀÇ µÎ²²¸¦ ºñÁ¢Ã˽ÄÀ¸·Î ÃøÁ¤ÇÏ´Â Àåºñ
- ¹Ú¸·ÀÇ Æ¯¼ººÐ¼®(µÎ²²), ¹Ì¼¼±¸Á¶ÀÇ ºÐ¼®,
- ±¤Æ¯¼º n,kÀÇ µ¿½Ã °áÁ¤, ´Ù¾çÇÑ ÀÀ¿ë¼º
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OLED I-V-L ½Ã½ºÅÛ
¾Ï»óÀÚ¿¡ OLED¼ÒÀÚ¸¦ Áö±×¿¡ ¹°·Á³Ö°í, µðÁöÅÐ ¼Ò½º¹ÌÅÍ¿Í ÆÞ½º¼Ò½º¹ÌÅÍ·Î Àü¾Ð ¶Ç´Â Àü·ù¸¦ Àΰ¡ÇÏ¿© cs-1000A, cs-100A·Î ¼ÒÀÚÀÇ ¹ß±¤Æ¯¼ºÀ» ºÐ¼®Çϱâ À§ÇØ ±¸¼º
- I-V-L ÃøÁ¤¿ë Áö±×, ¼ö¸íÃøÁ¤¿ë Áö±×
- ¾Ï»óÀÚ, µðÁöÅÐ ¼Ò½º¹ÌÅÍ(Keithley 2400), ÆÞ½º¼Ò½º¹ÌÅÍ(Keithley 2430)
- ½ºÆåÆ®·Î ¶óµð¿À¹ÌÅÍ(Minolta CS-1000A), ÈÖµµ»öÂ÷°è(CS-100A),
- ÀÎÅÍÆäÀ̽º¿ë PC·Î ±¸¼º
- OLED¼ÒÀÚÀÇ Àü·ù : Àü¾Ð ½ºÆåÆ®·³, »öÁÂÇ¥, ÈÖµµ, Àü·ùÈ¿À², ¿ÜºÎ¾çÀÚ È¿À², »ö¿Âµµ µîÀ» ÃøÁ¤
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¿øÀÚÇö¹Ì°æ (Atomic Force Microscopy)
ŽħÀÌ ½Ã·áÇ¥¸éÀ» °¡°¡ÀÇ À§Ä¡·Î ¿Å°Ü ´Ù´Ï¸é¼ ¿øÀÚ°£ÀÇ ÈûÀ» ÃøÁ¤ÇÔÀ¸·Î½á, °¢ Á¡¿¡¼ÀÇ ³ôÀÌ¿¡ ´ëÇÑ Á¤È®ÇÑ Á¤º¸¸¦ ¾ò´Â Àåºñ
- ÃÖ´ë ½Ã·á Å©±â: 100mmx100mm, 20mm(µÎ²²)
- ÃÖ´ë ½Ã·á ¹«°Ô : 500g - ½Ã·á ÀÌ¼Û °Å¸® : 25mmx25mm
- ÃÖ´ë X,Y ÃøÁ¤ ¿µ¿ª : 50§ (low voltage mode : 5§)
- ÇØ»óµµ : <0.15nm(low voltage mode : < 0.02nm)
- ÃÖ´ë Z ÃøÁ¤ °Å¸® : 12§(low voltage mode : 1.7§)
- ÇØ»óµµ : < 0.05nm (low voltage mode : < 0.01nm)
- Z servo ¼öÇà ´É·Â : ÃÖ¼Ò 10kHz ÀÌ»ó
- ¹Ú¸·ÀÇ Ç¥¸éºÐ¼®, ¹Ú¸·ÀÇ Ç¥¸é°üÂû, ¹ÝµµÃ¼ Ç¥¸é °üÃø, ±¹¼ÒÀû ¿µ¿ªÀÇ Ç¥¸é°ÅÄ¥±â ÃøÁ¤
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°í¼ÓÄ«¸Þ¶ó
°í¼ÓÀ¸·Î ÃÔ¿µÇÏ¿© Á¤»óÀûÀÎ ¼Óµµ·Î Àç»ýÇÏ¿© ÇÇ»çüÀÇ µ¿ÀÛÀÌ ¸Å¿ì ´À¸®°Ô º¸À̵µ·Ï ÇÏ´Â Àåºñ
- ¼¾¼ (sensor) : CMOS array, up to 1280x1024 pixels
- Main Memory : 1 GB
- Playback Rates
- Single step mode plus auto playback at 1, 2, 3, 4, 5, 10, 15, 25, 30, 50, 60, 125, 250, 500 or 1000 frames
- ·»ÁîŸÀÔ (Mounts)
- Standard C-mount lens mount, ¼-20tripod mount
- °í¼ÓÃÔ¿µÇÑ µðÁöÅÐ µ¥ÀÌÅ͸¦ ÄÄÇ»ÅÍ¿¡¼ Àú¼ÓÀ¸·Î À°¾ÈÀ¸·Î È®ÀÎÇÏ¸ç ¹°¸®Àûº¯È¸¦ °üÃø ºÐ¼®
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