Chromium Oxide (Cr2O3) Sputtering Target Description

The Chromium Oxide (Cr2O3) Sputtering Target is engineered using state-of-the-art fabrication techniques to ensure exceptional uniformity, high density, and superior durability in demanding deposition environments. Designed specifically for RF and RF-R sputtering, this target guarantees optimal performance with minimal impurities, making it a reliable choice for high-precision applications.

Chromium Oxide (Cr2O3) Sputtering Target Applications

· Semiconductor Manufacturing: Enables precise thin film deposition for integrated circuits and microelectronic devices.
· Optical Coatings: Ideal for depositing durable, high-performance coatings in optical components.
· Solar Cells: Facilitates the formation of efficient, stable layers in photovoltaic applications.
· Advanced Ceramics: Used in various ceramic processing techniques requiring high-purity oxide targets.
· Research and Development: Supports experimental deposition processes for innovative material applications. 

Chromium Oxide (Cr2O3) Sputtering Target Packing

Our Chromium Oxide (Cr2O3) Sputtering Targets are carefully packaged to maintain their integrity during storage and transportation. Products are typically vacuum-sealed and packaged according to customer specifications to ensure safe delivery and preserve material quality.

Frequently Asked Questions

Q: What does RF sputtering mean?
A: RF sputtering refers to the use of radio frequency power to generate plasma, which dislodges target material for thin film deposition, making it suitable for insulating and dielectric materials.

Q: How important is purity in a sputtering target?
A: High purity (≥99%) is critical as it minimizes contamination in the deposited films, ensuring the performance and reliability of the final product.

Q: Can the shape of the sputtering target be customized?
A: Yes, the product is available in standard disc shapes or can be custom-made according to specific process requirements.

Q: Which industries benefit from the use of Chromium Oxide sputtering targets?
A: Industries such as semiconductor manufacturing, optics, solar energy, and advanced ceramics, as well as R&D sectors, benefit from the high performance of Chromium Oxide sputtering targets.

Q: What storage conditions are recommended for these sputtering targets?
A: It is recommended to store the targets in a controlled environment free from moisture and contaminants, typically in vacuum-sealed packaging to maintain their pristine condition.

Specification

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.