Cerium Oxide (CeO2) Sputtering Target Description

The Cerium Oxide (CeO2) Sputtering Target is a high-performance material designed for advanced thin film deposition applications. Manufactured using state-of-the-art fabrication methods, this target ensures uniform energy distribution and consistent film quality during sputtering. Its excellent thermal stability and resistance to oxidation make it particularly suitable for applications in semiconductors, optics, and ceramics. The customized shapes and sizes enable versatile integration into various deposition systems, delivering reliable and efficient performance in demanding industrial environments.

Cerium Oxide (CeO2) Sputtering Target Applications

· Thin Film Deposition: Ideal for semiconductor devices and optical coatings.
· Surface Modification: Enhances wear resistance and provides corrosion protection.
· Advanced Coatings: Utilized in engineered surfaces for catalyst supports, sensors, and energy devices.
· Optoelectronics: Applied in the production of displays and photovoltaic cells.

Cerium Oxide (CeO2) Sputtering Target Packing

Our Cerium Oxide (CeO2) Sputtering Target is carefully packaged to ensure its integrity during transit and storage. Typically vacuum-sealed or secured in custom-molded packaging designed specifically for configuration and size requirements.

Frequently Asked Questions

Q: What is the primary application of the Cerium Oxide (CeO₂) Sputtering Target?
A: It is primarily used for thin film deposition in semiconductor, optical, and high-tech coating applications.

Q: Which sputtering methods are compatible with this target?
A: The target is optimized for RF and RF-R sputtering processes.

Q: Can I request a custom size or shape for the target?
A: Yes, the target is available in customized sizes including standard discs or other bespoke configurations.

Q: How does the purity level of ≥99% affect performance?
A: A high purity level ensures consistent sputtering performance and superior film quality by minimizing impurities during the deposition process.

Q: What industries benefit most from using this sputtering target?
A: Industries such as semiconductor manufacturing, optics, ceramics, and advanced coating applications benefit greatly from its precision and high-performance characteristics.

Specification

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.