Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Praseodymium Fluoride Sputtering Target, PrF3
Praseodymium Fluoride Sputtering Target
Description
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. Praseodymium is often used in the production of magnets, lasers, and other technologies.
A sputtering target is a material used in a process called sputter deposition, which is a technique commonly employed in the manufacturing of thin films. Thin films find applications in various industries, including electronics, optics, and coatings. Sputtering is a physical vapor deposition (PVD) method where high-energy ions are used to dislodge atoms from a target material, and these atoms then deposit onto a substrate, forming a thin film.
Praseodymium Fluoride Sputtering Target Specifications
|
Compound Formula |
PrF3 |
|
Molecular Weight |
197.9 |
|
Appearance |
Green target |
|
Melting Point (℃) |
1395 |
|
Density (g/cm3) |
6.3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Praseodymium Fluoride Sputtering Target Handling Notes
- Indium bonding is recommended for Praseodymium Fluoride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Praseodymium Fluoride Sputtering Target Application
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. The use of praseodymium fluoride in thin films may have applications in optical coatings, sensors, and other electronic devices
Praseodymium Fluoride Sputtering Target Packaging
Our Praseodymium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.
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