Cerium Oxide (CeO2) Sputtering Target Description The Cerium Oxide (CeO2) Sputtering Target is a high-performance material designed for advanced thin film deposition applications. Manufactured using state-of-the-art fabrication methods, this target ensures uniform energy distribution and consistent film quality during sputtering. Its excellent thermal stability and resistance to oxidation make it particularly suitable for applications in semiconductors, optics, and ceramics. The customized shapes and sizes enable versatile integration into various deposition systems, delivering reliable and efficient performance in demanding industrial environments. Cerium Oxide (CeO2) Sputtering Target Applications · Thin Film Deposition: Ideal for semiconductor devices and optical coatings. · Surface Modification: Enhances wear resistance and provides corrosion protection. · Advanced Coatings: Utilized in engineered surfaces for catalyst supports, sensors, and energy devices. · Optoelectronics: Applied in the production of displays and photovoltaic cells. Cerium Oxide (CeO2) Sputtering Target Packing Our Cerium Oxide (CeO2) Sputtering Target is carefully packaged to ensure its integrity during transit and storage. Typically vacuum-sealed or secured in custom-molded packaging designed specifically for configuration and size requirements. Frequently Asked Questions Q: What is the primary application of the Cerium Oxide (CeO₂) Sputtering Target? A: It is primarily used for thin film deposition in semiconductor, optical, and high-tech coating applications. Q: Which sputtering methods are compatible with this target? A: The target is optimized for RF and RF-R sputtering processes. Q: Can I request a custom size or shape for the target? A: Yes, the target is available in customized sizes including standard discs or other bespoke configurations. Q: How does the purity level of ≥99% affect performance? A: A high purity level ensures consistent sputtering performance and superior film quality by minimizing impurities during the deposition process. Q: What industries benefit most from using this sputtering target? A: Industries such as semiconductor manufacturing, optics, ceramics, and advanced coating applications benefit greatly from its precision and high-performance characteristics. Specification Specification Details Material Cerium Oxide Symbol CeO₂ Color/Appearance Off-white to light yellow Melting Point ~2,600℃ Density 7.13 g/cm³ Sputter RF, RF-R Type of Bond Indium, Elastomer Available Sizes Customized *The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Strontium Iron Oxide Sputtering Target Description The Strontium Iron Oxide Sputtering Target, SrFe12O19 is engineered to meet the high standards required for modern sputtering applications. Crafted with exceptional purity (≥99%), this target ensures consistent performance and reliable operation in processes such as thin film deposition. Its high melting point of 450 °C and density of 8.02 g/cm³ contribute to its suitability in environments demanding precise thermal management and structural integrity. Designed for versatility, the target is available as standard discs or can be customized to unique customer specifications, ensuring optimal compatibility with various sputtering systems. Strontium Iron Oxide Sputtering Target Applications · Thin Film Deposition: Ideal for creating uniform metallic, magnetic, or insulating thin films in semiconductor and microelectronic processes. · Microelectronics: Used in the fabrication of integrated circuits where precision and reliability are critical. · Optoelectronic Devices: Supports the development of displays, sensors, and photovoltaic cells by providing consistent material properties. · Research & Development: Suitable for experimental sputtering applications where material performance and reproducibility are essential. Strontium Iron Oxide Sputtering Target Packing The sputtering targets are securely packaged to preserve their quality and integrity during storage and transit. Standard packaging includes protective containers designed to minimize contamination and mechanical damage. Customized packaging solutions are also available to meet specific customer requirements. Frequently Asked Questions Q: What is the exact composition of the sputtering target? A: The composition is SrFe₁₂O₁₉. Q: What shapes are available for this product? A: The product is available in discs or can be custom-made to meet specific requirements. Q: What is the purity level of the sputtering target? A: The purity is maintained at ≥99%. Q: What does the melting point of 450 °C imply for its applications? A: The melting point indicates excellent thermal stability, making it ideal for high-temperature sputtering processes. Q: How is the sputtering target packaged? A: The targets are packaged in secure, protective containers, with customized packaging options available as per customer needs. Specification Parameter Value Material Strontium Iron Oxide (SrFe₁₂O₁₉) CAS Number 12023-91-5 Purity ≥99% Shapes Discs, or Custom-made Melting Point 450 °C Density 8.02 g/cm³ Sputter N/A Type of Bond Indium Available Sizes Customized *The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Chromium Oxide (Cr2O3) Sputtering Target Description The Chromium Oxide (Cr2O3) Sputtering Target is engineered using state-of-the-art fabrication techniques to ensure exceptional uniformity, high density, and superior durability in demanding deposition environments. Designed specifically for RF and RF-R sputtering, this target guarantees optimal performance with minimal impurities, making it a reliable choice for high-precision applications. Chromium Oxide (Cr2O3) Sputtering Target Applications · Semiconductor Manufacturing: Enables precise thin film deposition for integrated circuits and microelectronic devices. · Optical Coatings: Ideal for depositing durable, high-performance coatings in optical components. · Solar Cells: Facilitates the formation of efficient, stable layers in photovoltaic applications. · Advanced Ceramics: Used in various ceramic processing techniques requiring high-purity oxide targets. · Research and Development: Supports experimental deposition processes for innovative material applications. Chromium Oxide (Cr2O3) Sputtering Target Packing Our Chromium Oxide (Cr2O3) Sputtering Targets are carefully packaged to maintain their integrity during storage and transportation. Products are typically vacuum-sealed and packaged according to customer specifications to ensure safe delivery and preserve material quality. Frequently Asked Questions Q: What does RF sputtering mean? A: RF sputtering refers to the use of radio frequency power to generate plasma, which dislodges target material for thin film deposition, making it suitable for insulating and dielectric materials. Q: How important is purity in a sputtering target? A: High purity (≥99%) is critical as it minimizes contamination in the deposited films, ensuring the performance and reliability of the final product. Q: Can the shape of the sputtering target be customized? A: Yes, the product is available in standard disc shapes or can be custom-made according to specific process requirements. Q: Which industries benefit from the use of Chromium Oxide sputtering targets? A: Industries such as semiconductor manufacturing, optics, solar energy, and advanced ceramics, as well as R&D sectors, benefit from the high performance of Chromium Oxide sputtering targets. Q: What storage conditions are recommended for these sputtering targets? A: It is recommended to store the targets in a controlled environment free from moisture and contaminants, typically in vacuum-sealed packaging to maintain their pristine condition. Specification Parameter Value Material Chromium Oxide Formula Cr₂O₃ CAS Number 1308-38-9 Purity ≥99% Color/Appearance Dark green, opaque Melting Point 2435℃ Density 5.22 g/cm³ Sputter RF, RF-R Type of Bond Indium, Elastomer Available Sizes Customized *The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Strontium Vanadate Sputtering Target Description The Strontium Vanadate Sputtering Target, SrVO₃ is engineered for superior performance in sputtering deposition processes. With a purity level of ≥99%, this target ensures a consistent and high-quality deposition necessary for producing fine thin films. Designed to accommodate specific application needs, it is available in disc form or can be custom-made to meet unique manufacturing requirements. Its advanced composition and precise fabrication make it an ideal choice for industries requiring reliable thin film coatings, including semiconductor manufacturing, optical device fabrication, and sensor technology. The use of an indium bond further enhances the material’s stability during sputtering processes, ensuring optimal efficiency and performance. Strontium Vanadate Sputtering Target Applications · Thin Film Deposition: Perfect for semiconductor and electronic device manufacturing. · Optical Coatings: Used in the production of high-quality lenses and filters. · Sensor Fabrication: Ensures precise and uniform film deposition for sensitive sensor elements. · Research and Development: Ideal for experimental setups in advanced material studies. Strontium Vanadate Sputtering Target Packing Our Strontium Vanadate Sputtering Targets are carefully packaged to maintain their high quality during storage and transportation. They are vacuum-sealed in protective packaging suited to preserve the integrity of the target until installation. Frequently Asked Questions Q: What industries use the Strontium Vanadate Sputtering Target? A: It is widely used in semiconductor fabrication, optical coating production, sensor manufacturing, and advanced materials research. Q: What does a purity level of ≥99% imply for this product? A: A purity level of ≥99% ensures high consistency and reliability in deposition processes, leading to superior thin film quality. Q: Can the shapes of the sputtering targets be customized? A: Yes, apart from standard discs, the targets can be custom-made to meet specific requirements. Q: What is the significance of using indium as the bonding material? A: Indium bonds provide excellent adhesion and thermal conductivity, enhancing the stability of the target during sputtering. Q: How should the product be stored before use? A: The product should be stored in a clean, dry, and temperature-controlled environment to maintain its quality and performance. Specification Specification Details Material Strontium Vanadate (SrVO₃) Symbol SrVO₃ Color/Appearance Typically a uniform, solid appearance (custom finishes available) Melting Point N/A Density N/A Sputter N/A Type of Bond Indium Available Sizes Customized *The above product information is based on theoretical data and is for reference only. Actual specifications may vary.