Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Copper Aluminum Sputtering Target, Cu/Al
Copper Aluminum Sputtering Target Description
The copper aluminum sputtering target is made of high-quality copper aluminum alloys. Copper aluminum alloys are most valued for their higher strength and corrosion resistance as compared to other bronze alloys. These alloys are tarnish-resistant and show low rates of corrosion in atmospheric conditions, low oxidation rates at high temperatures, and low reactivity with sulfurous compounds and other exhaust products of combustion. They are also resistant to corrosion in seawater. Copper aluminum alloy’s resistance to corrosion results from the aluminum in the alloys, which reacts with atmospheric oxygen to form a thin, tough surface layer of alumina (aluminum oxide) which acts as a barrier to corrosion of the copper-rich alloy.
Copper Aluminum Sputtering Target Packaging
Our copper aluminum sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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