Different Types of Evaporation Materials
(주)연진에스텍은 Granule, Beads & Sphere, Lump, Rod, Powder, Single Crystal 등 대부분의 Evaporation Process에 부합하는 다양한 형태의 증발 증착물질을 제공합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Tantalum Silicide Evaporation Materials
Description
High purity evaporation materials play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.95% purity tantalum silicide evaporation materials using quality assurance processes to guarantee product reliability.
Tantalum Silicide Evaporation Materials Specification
|
CAS No. |
12039-79-1 |
|
Molecular Weight |
237.12 g/mol |
|
Melting Point |
2200℃ |
|
Density |
9.14g/cm3 |
|
Resistivity |
8.5 (ρ/μΩ.cm) |
|
InChI Key |
MANYRMJQFFSZKJ-UHFFFAOYSA-N |
Tantalum Silicide Evaporation Materials Application
• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)
• Used for optics including wear protection, decorative coatings, and displays.
Tantalum Silicide Evaporation Materials Packaging
Our tantalum silicide evaporation materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
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