Silicon Monoxide Sputtering Target Description Silicon monoxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Si and O. Silicon is a chemical element that originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with a location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Silicon Monoxide Sputtering Target Specification Compound Formula SiO Molecular Weight 44.085 Appearance black-brown glassy solid Melting Point 1702 °C Boiling Point 1880 °C Density 2.13 g/cm Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Silicon Monoxide Sputtering Target Handling Notes 1. Indium bonding is recommended for SiO sputtering material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. This material has a low thermal conductivity and is susceptible to thermal shock. Silicon Monoxide Sputtering Target Packaging Our silicon monoxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Chromium-doped Silicon Monoxide Sputtering Target Description Chromium-doped silicon monoxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Cr, Si and O. Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty. Silicon is a chemical element that originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with a location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Chromium-doped Silicon Monoxide Sputtering Target Packaging Our chromium-doped silicon monoxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Strontium Ruthenate Sputtering Target Description Strontium ruthenate sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Sr, Ru and O. Strontium is a chemical element that originated from Strontian, a small town in Scotland. It was first mentioned in 1787 and observed by W. Cruikshank. The isolation was later accomplished and announced by H. Davy. “Sr” is the canonical chemical symbol of strontium. Its atomic number in the periodic table of elements is 38 with a location at Period 5 and Group 2, belonging to the s-block. The relative atomic mass of strontium is 87.62(1) Dalton, the number in the brackets indicating the uncertainty. Ruthenium is a chemical element that originated from Russia (with the Latin name Ruthenia). It was first mentioned in 1807 and observed by J. Sniadecki. The isolation was later accomplished and announced by J. Sniadecki. “Ru” is the canonical chemical symbol of ruthenium. Its atomic number in the periodic table of elements is 44 with the location at Period 5 and Group 8, belonging to the d-block. The relative atomic mass of ruthenium is 101.07(2) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Strontium Ruthenate Sputtering Target Packaging Our strontium ruthenate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Strontium Titanate Sputtering Target Description Strontium titanate sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Sr, Ti and O. Strontium is a chemical element that originated from Strontian, a small town in Scotland. It was first mentioned in 1787 and observed by W. Cruikshank. The isolation was later accomplished and announced by H. Davy. “Sr” is the canonical chemical symbol of strontium. Its atomic number in the periodic table of elements is 38 with a location at Period 5 and Group 2, belonging to the s-block. The relative atomic mass of strontium is 87.62(1) Dalton, the number in the brackets indicating the uncertainty. Titanium is a chemical element that originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Strontium Titanate Sputtering Target Handling Notes SrTiO3 (스토론튬 티타네이드) 스퍼터링 소재에는 취성, 낮은 열전도도 등 스퍼터링에 적합하지 않은 특성이 있기 때문에 elatomer 본딩이 권장됩니다. 이 재료는 열전도율이 낮고 열충격을 받기 쉽습니다. Strontium Titanate Sputtering Target Packaging Our strontium titanate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Strontium Zirconate Sputtering Target Description Strontium zirconate sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Sr, Zr and O. Strontium is a chemical element that originated from Strontian, a small town in Scotland. It was first mentioned in 1787 and observed by W. Cruikshank. The isolation was later accomplished and announced by H. Davy. “Sr” is the canonical chemical symbol of strontium. Its atomic number in the periodic table of elements is 38 with a location at Period 5 and Group 2, belonging to the s-block. The relative atomic mass of strontium is 87.62(1) Dalton, the number in the brackets indicating the uncertainty. Zirconium is a chemical element that originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with a location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Strontium Zirconate Sputtering Target Packaging Our strontium zirconate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Tantalum Oxide Sputtering Target Description Tantalum is a chemical element that originated from King Tantalus, the father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with a location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Tantalum Oxide Sputtering Target Specification Compound Formula Ta2O5 Molecular Weight 441.89 Appearance White solid Melting Point 1,872° C Density 8.2 g/cm3 Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Tantalum Oxide Sputtering Target Handling Notes 1. Indium bonding is recommended for tantalum oxide sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. This material has a low thermal conductivity and is susceptible to thermal shock. Tantalum Oxide Sputtering Target Packaging Our tantalum oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Thulium Oxide Sputtering Target Description Thulium is a chemical element that originated from Thule, the ancient name for Scandinavia. It was first mentioned in 1879 and observed by T. Cleve. The isolation was later accomplished and announced by T. Cleve. “Tm” is the canonical chemical symbol of thulium. Its atomic number in the periodic table of elements is 69 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of thulium is 168.93421(2) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Thulium Oxide Sputtering Target Specification Compound Formula Tm2O3 Appearance White Melting Point 2,341° C Density 8600 kg/m3 Thulium Oxide Sputtering Target Packaging Our Thulium Oxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Tin Oxide Sputtering Target Description Tin oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Sn and O. Tin, also called stannum, is a chemical element that originated from the Anglo-Saxon word tin (stannum in Latin, meaning hard). It was early used in 3500 BC. “Sn” is the canonical chemical symbol of tin. Its atomic number in the periodic table of elements is 50 with a location at Period 5 and Group 14, belonging to the p-block. The relative atomic mass of tin is 118.710(7) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Tin Oxide Sputtering Target Specification Compound Formula SnO2 Molecular Weight 150.69 Appearance White to gray solid Melting Point 1630 °C Density 6.95 g/cm3 Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Tin Oxide Sputtering Target Handling Notes 1. Elastomer bonding is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. This material has a low thermal conductivity and is susceptible to thermal shock. Tin Oxide Sputtering Target Packaging Our tin oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Titanium Trioxide Sputtering Target Description Titanium trioxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Ti and O. Titanium is a chemical element that originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Titanium Trioxide Sputtering Target Specification Material Type Titanium Trioxide Compound Formula Ti2O3 Molecular Weight 143.73 g/mol Appearance Violet black solid Melting Point 2,130° C (3,866° F) Type of Bond Indium Titanium Trioxide Sputtering Target Bonding Service Indium Bonding is available for Titanium Trioxide Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Titanium Trioxide Sputtering Target Packaging Our Titanium Trioxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.