Lanthanum Strontium Copper Oxide Sputtering Target Description The lanthanum strontium copper oxide sputtering target is composed of lanthanum, strontium, copper, and oxygen. High-purity lanthanum strontium copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Strontium Copper Oxide Sputtering Target Specification Material Type Lanthanum Strontium Copper Oxide Symbol La(1-x)SrxCuO4 Color/Appearance Dark Gray Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Strontium Copper Oxide Sputtering Target Application The lanthanum strontium copper oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Strontium Copper Oxide Sputtering Target Packaging Our lanthanum strontium copper oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lead Calcium Titanate Sputtering Target Description The lead calcium titanate sputtering target is composed of lead, calcium, titanium, and oxygen. High-purity lead calcium titanate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lead Calcium Titanate Sputtering Target Specification Material Type Lead Calcium Titanate Symbol PCT, Pb0.7Ca0.3TiO3 Color/Appearance Gray Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lead Calcium Titanate Sputtering Target Application The lead calcium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lead Calcium Titanate Sputtering Target Packaging Our lead calcium titanate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lead Zirconate Titanate With Niobium Sputtering Target Description The lead zirconate titanate with niobium sputtering target is composed of lead, zirconium, titanium, niobium and oxygen. High-purity lead zirconate titanate with niobium sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lead Zirconate Titanate With Niobium Sputtering Target Specification Material Type Lead Zirconate Titanate With Niobium Symbol PbZr 0.52Ti 0.48O3 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lead Zirconate Titanate With Niobium Sputtering Target Application The lead zirconate titanate with niobium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lead Zirconate Titanate With Niobium Sputtering Target Packaging Our lead zirconate titanate with niobium sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lithium Nickel Cobalt Oxide Sputtering Target Description Lithium nickel cobalt oxide sputtering target is composed of lithium, nickel, cobalt, and oxygen. High-purity lithium nickel cobalt oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lithium Nickel Cobalt Oxide Sputtering Target Specification Material Type Lithium Nickel Cobalt Oxide Symbol LNCO Color/Appearance Black Gray Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lithium Nickel Cobalt Oxide Sputtering Target Application The lithium nickel cobalt oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lithium Nickel Cobalt Oxide Sputtering Target Packaging Our lithium nickel cobalt oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lithium Silicate Sputtering Target Description Lithium silicate sputtering target is a black sputtering material with the element Li, Si and O. It is a conductive ceramic solid electrolyte material for lithium-ion batteries. Lithium is a chemical element originated from the Greek ‘lithos’, meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty. Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty. Lithium Silicate Sputtering Target Specification Material Type Lithium Silicate Symbol Li4SiO4 Color/Appearance White Solid Melting Point 1,256 °C Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Lithium Silicate Sputtering Target Packaging Our lithium silicate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Lithium Titanate Sputtering Target Description Lithium titanate sputtering target is composed of lithium, titanium, and oxygen. High-purity lithium titanate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lithium Titanate Sputtering Target Specification Material Type Lithium Titanate Symbol Li4Ti5O12, LTO Color/Appearance White Solid Melting Point 1,533 °C (2,791 °F; 1,806 K) Density 3.43 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lithium Titanate Sputtering Target Application The lithium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lithium Titanate Sputtering Target Packaging Our lithium titanate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lithium Zirconate Sputtering Target Description Lithium zirconate sputtering target is a black sputtering material with the element Li and Zr. It is a conductive ceramic solid electrolyte material for lithium-ion batteries. Lithium is a chemical element originated from the Greek ‘lithos’, meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty. Zirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty. Lithium Zirconate Sputtering Target Specification Material Type Lithium Zirconate Symbol LiZrOx Color/Appearance White Solid Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Lithium Zirconate Sputtering Target Packaging Our lithium zirconate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Magnesium Zinc Oxide Sputtering Target Description The magnesium zinc oxide sputtering target is composed of magnesium, zinc, and oxygen. High-purity magnesium-zinc oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Magnesium Zinc Oxide Sputtering Target Specification Material Type Magnesium Zinc Oxide Symbol Mg(1-x)ZnxO Color/Appearance White Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Magnesium Zinc Oxide Sputtering Target Application The magnesium zinc oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Magnesium Zinc Oxide Sputtering Target Packaging Our magnesium zinc oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Manganese Cobalt Oxide Sputtering Target Description Manganese Cobalt Oxide Sputtering Target is composed of manganese, cobalt, and oxygen. High-purity manganese cobalt oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Manganese Cobalt Oxide Sputtering Target Specification Material Type Manganese Cobalt Oxide Symbol MnCo2O4 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Manganese Cobalt Oxide Sputtering Target Application The Manganese Cobalt Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Manganese Cobalt Oxide Sputtering Target Bonding Services Target Bonding Service is available for Manganese Cobalt Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Manganese Cobalt Oxide Sputtering Target Packaging Our Manganese Cobalt Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.