Boron Oxide-doped Lithium Phosphate Product Overview Stanford Advanced Materials (SAM) presents the Boron Oxide-Doped Lithium Phosphate Target (Li₃PO₄: B₂O₃), a premium sputtering material meticulously developed for solid-state electrolyte and thin film applications. This target is engineered to deliver superior ionic conductivity and enhanced stability, making it ideal for cutting-edge lithium battery technologies and advanced microelectronic devices. B2O3 Key Specifications Material: Li₃PO₄: B₂O₃ Purity: 99.9% Shape: Planar Disc Note: Specifications provided are based on theoretical data. For customized specifications and detailed inquiries, please contact our sales team. B2O3 Product Description The Boron Oxide-Doped Lithium Phosphate Target (Li₃PO₄: B₂O₃) combines the robust properties of lithium phosphate with the versatile characteristics of boron oxide. Lithium phosphate (Li₃PO₄) is renowned for its exceptional chemical stability, broad electrochemical window, and commendable ionic conductivity, making it a standout candidate for solid-state electrolytes. By doping with boron oxide (B₂O₃), the glassy structure of lithium phosphate is enhanced, promoting an amorphous nature that boosts ionic mobility. This doped target excels in forming uniform, high-quality thin films with excellent compatibility across various substrates. It maintains structural integrity during the sputtering process, offers superior thermal stability, and ensures the deposition of smooth, stoichiometrically consistent films. These features render it perfect for applications like thin-film batteries, protective electrode coatings, and sophisticated microelectronic components. B2O3 Applications Solid-State Lithium Batteries: Acts as a solid electrolyte layer, enhancing ionic conductivity and overall battery performance. Protective Electrode Coatings: Prevents electrode degradation, thereby extending battery life and reliability. Microelectronics: Utilized in ion-conductive films essential for advanced microelectronic devices. Energy Storage Devices: Facilitates stable and uniform thin film deposition crucial for next-generation energy storage solutions. Research and Development: Ideal for developing all-solid-state batteries and microbattery systems due to its superior film-forming capabilities. B2O3 Packaging Our Boron Oxide-Doped Lithium Phosphate Targets are packaged with precision to ensure their safety and integrity during transit and storage. Depending on the size, smaller targets are securely packed in polypropylene (PP) boxes, while larger ones are shipped in bespoke wooden crates. We prioritize customized packaging solutions and utilize appropriate cushioning materials to provide maximum protection. Packaging Options: Carton Wooden Crate Custom Packaging Manufacturing Process Manufacturing Workflow Testing Methods Chemical Composition Analysis: Ensure material purity and accurate composition using techniques like Glow Discharge Mass Spectrometry (GDMS) or X-ray Fluorescence (XRF). Mechanical Properties Testing: Assess tensile strength, yield strength, and elongation to determine material performance under stress. Dimensional Inspection: Measure thickness, diameter, and other dimensions to confirm compliance with specified tolerances. Surface Quality Inspection: Detect defects such as scratches, cracks, or inclusions through visual and ultrasonic examinations. Hardness Testing: Evaluate material hardness to ensure uniformity and mechanical reliability. Frequently Asked Questions Q1: What benefits does Boron Oxide-Doped Lithium Phosphate offer as a sputtering target? A1: It provides outstanding ionic conductivity, exceptional chemical stability, and excellent film-forming properties, making it ideal for applications in thin-film batteries and other electrochemical devices. Q2: What are the common uses of Li₃PO₄: B₂O₃ targets? A2: These targets are primarily used in the production of solid-state lithium-ion batteries, thin-film batteries, and as solid electrolytes or protective layers in various electrochemical devices. Q3: Is the target compatible with both RF and DC sputtering systems? A3: Yes, the Boron Oxide-Doped Lithium Phosphate Target is suitable for use in both RF and DC sputtering techniques, depending on the specific system design and process requirements. Performance Comparison: Li₃PO₄: B₂O₃ vs. Competing Materials Property Li₃PO₄: B₂O₃ Li₃PO₄ (Standard) LiFePO₄ YBCO (YBa₂Cu₃O₇) STO (SrTiO₃) Composition Li₃PO₄ doped with B₂O₃ Pure Li₃PO₄ Olivine LiFePO₄ Yttrium Barium Copper Oxide SrTiO₃ Perovskite Purity 95%+ 99% 99% 99.99% 99.95% Ionic Conductivity (S/cm) ~1×10⁻⁴ (optimized) ~1×10⁻⁵ ~1×10⁻¹⁴ Superconducting (below Tc) High resistivity (~10¹² Ω·cm) Thermal Stability (°C) Up to 1200 Up to 1000 Up to 800 Up to 900 (sintering) Up to 1400 Key Applications Radiation detectors, optoelectronic films Solid electrolytes, interface coatings Cathodes for lithium-ion batteries Superconducting films, quantum devices Dielectric layers, substrates Form (Target) Custom shapes (disc, rectangular) Powder, thin films Pellets, powders Sputtering targets Single-crystal substrates ​​​​​​ Raw Materials Information Lithium (Li) Lithium is a soft, silvery-white alkali metal with atomic number 3, recognized as the lightest metal and one of the most reactive elements. It is highly flammable and reacts vigorously with water to produce lithium hydroxide and hydrogen gas. Due to its low atomic mass and high electrochemical potential, lithium is indispensable in energy storage systems, particularly in lithium-ion and lithium-polymer batteries. Additionally, lithium is utilized in ceramics, glass production, aerospace alloys, and nuclear fusion processes. In thin film and sputtering applications, lithium compounds are essential as cathode materials for rechargeable batteries. Phosphorus (P) Phosphorus is a non-metallic element with atomic number 15, existing in multiple allotropic forms, predominantly white and red phosphorus. It is vital for all living organisms, being a fundamental component of DNA, RNA, and ATP. Industrially, phosphorus is extensively used in fertilizers, flame retardants, metallurgy, and specialty glass and coatings due to its reactive and versatile nature. Boron (B) Boron is a metalloid with atomic number 5, known for its high melting point, complex bonding characteristics, and diverse structural forms. It plays a crucial role in the production of borosilicate glass, ceramics, semiconductors, and composite materials. Boron compounds, such as boric acid and boron carbide, are valued for their thermal stability, hardness, and applications in advanced materials, including nuclear reactors and permanent magnets.

Lithium Titanium Phosphate Product Overview Stanford Advanced Materials (SAM) introduces the Lithium Titanium Phosphate Target (LiTi₂(PO₄)₃), a top-tier sputtering material engineered for thin film deposition. This high-performance target offers exceptional stability and efficiency, making it ideal for applications in energy storage and advanced electronic devices. Lithium Titanium Phosphate Key Specifications Material: LiTi₂(PO₄)₃ CAS Number: 30622-39-0 Purity: 99.9% Shape: Planar Disc Note: The specifications provided are based on theoretical data. For customized sizes and detailed inquiries, please contact our sales team. Lithium Titanium Phosphate Product Description The Lithium Titanium Phosphate Target (LiTi₂(PO₄)₃) is distinguished by its remarkable stability and superior electrochemical performance, making it highly suitable for energy storage solutions. This material boasts excellent ionic conductivity and high thermal stability, enabling effective performance in high-temperature environments. As a member of the lithium metal phosphate family, LiTi₂(PO₄)₃ features a robust crystal structure that ensures durability and consistent performance in energy storage devices. Its chemical stability contributes to an extended lifespan and resistance to degradation, which are critical for battery longevity. Additionally, the material facilitates efficient lithium-ion migration, making it an optimal choice for lithium-ion batteries and supercapacitors. Lithium Titanium Phosphate Applications Lithium-Ion Batteries: Enhances ionic conductivity and battery longevity by serving as a robust component in the electrolyte layer. Supercapacitors: Provides high stability and long cycle life, crucial for efficient energy storage. Energy Storage Devices: Ideal for use in electric vehicles, portable electronics, and renewable energy systems where reliable performance under varying conditions is essential. Advanced Electronics: Utilized in the development of high-performance electronic devices requiring stable and efficient energy storage solutions. Lithium Titanium Phosphate Packaging Our Lithium Titanium Phosphate Targets are packed with meticulous attention to ensure their safety and integrity during transportation and storage. Depending on the size, smaller targets are securely placed in polypropylene (PP) boxes, while larger targets are shipped in custom wooden crates. We prioritize customized packaging solutions and use appropriate cushioning materials to provide maximum protection. Packaging Options: Carton Wooden Crate Custom Packaging Manufacturing Process Manufacturing Workflow Testing Methods Chemical Composition Analysis: Verify material purity and accurate composition using techniques like Glow Discharge Mass Spectrometry (GDMS) or X-ray Fluorescence (XRF). Mechanical Properties Testing: Assess tensile strength, yield strength, and elongation to evaluate material performance under stress. Dimensional Inspection: Measure thickness, diameter, and other dimensions to ensure compliance with specified tolerances. Surface Quality Inspection: Identify defects such as scratches, cracks, or inclusions through visual and ultrasonic examinations. Hardness Testing: Determine material hardness to confirm uniformity and mechanical reliability. Frequently Asked Questions Q1: What is the Lithium Titanium Phosphate Target (LiTi₂(PO₄)₃)? A1: The Lithium Titanium Phosphate Target (LiTi₂(PO₄)₃) is a material widely used in the production of energy storage devices, such as lithium-ion batteries, due to its high thermal stability, excellent ionic conductivity, and chemical robustness. Q2: What are the main properties of LiTi₂(PO₄)₃? A2: LiTi₂(PO₄)₃ offers high ionic conductivity, superior thermal stability, and strong chemical stability. It has a high capacity for lithium-ion storage, making it an ideal material for enhancing battery performance. Q3: What are the primary applications of the Lithium Titanium Phosphate Target (LiTi₂(PO₄)₃)? A3: It is primarily used in lithium-ion batteries, supercapacitors, and various energy storage devices. Its properties make it especially suitable for electric vehicles, portable electronic devices, and renewable energy storage systems where efficient and reliable energy storage is critical. Performance Comparison: LiTi₂(PO₄)₃ vs. Competing Materials Property LiTi₂(PO₄)₃ LiTi₂(PO₄)₃ (Standard) LiFePO₄ Ionic Conductivity (S/cm) ~1×10⁻⁴ ~1×10⁻⁴ ~1×10⁻¹⁴ Specific Capacity (mAh/g) 109-142.7 (initial) 109-142.7 150-170 Specific Capacity (mAh/g) Solid-state reaction Solid-state reaction Hydrothermal/solid-state Key Advantages Low cost, NASICON structure, stable in aqueous environments Low cost, NASICON structure, stable in aqueous environments High thermal stability, long cycle life Key Limitations Moderate ionic conductivity, capacity fade at high rates Moderate ionic conductivity, capacity fade at high rates Low energy density, poor rate performance Raw Materials Information Lithium (Li) Symbol: Li Atomic Number: 3 Category: Alkali Metal Appearance: Soft, silvery-white metal Properties: Lithium is the lightest metal and the lightest solid element. It is highly reactive and flammable, especially when exposed to water or moisture. Lithium is an excellent conductor of electricity and is widely used in rechargeable batteries, heat-resistant glass, and ceramics. Uses: Essential in the production of lithium-ion batteries for mobile phones, laptops, electric vehicles, and renewable energy storage. It is also used in pharmaceuticals for treating bipolar disorder and in alloy production for aircraft components. Titanium (Ti) Symbol: Ti Atomic Number: 22 Category: Transition Metal Appearance: Lustrous, metallic, silver-gray Properties: Titanium is renowned for its high strength-to-weight ratio, corrosion resistance, and heat resistance. It is as strong as steel but 45% lighter and highly resistant to corrosion from saltwater, acids, and alkalis. Titanium is also biocompatible, making it safe for use in medical implants. Uses: Utilized in aerospace, medical implants, and military applications due to its strength and lightness. It is also widely used in the production of high-performance alloys, jewelry, and pigments. Phosphorus (P) Symbol: P Atomic Number: 15 Category: Non-metal Appearance: Exists in several allotropes, including white, red, and black phosphorus. White phosphorus is a waxy solid, whereas red phosphorus is more stable and powdery. Properties: Highly reactive, especially white phosphorus, which spontaneously combusts in air. Phosphorus is essential for life, being a key component of DNA, RNA, and ATP. It is commonly found in fertilizers and detergents. Uses: Primarily used in fertilizers to promote plant growth. It is also used in flame retardants, pesticides, and in the production of phosphoric acid for various industrial processes. White phosphorus is utilized in military applications, such as smoke screens and incendiary devices.

Product Description The Lithium Silicon Phosphate Target (LiSiPO₄) stands out for its superior ionic conductivity and robust structural stability, making it an ideal choice for solid-state electrolytes and thin film battery technologies. As a ceramic compound, LiSiPO₄ boasts a dense microstructure accompanied by excellent thermal and chemical stability, ensuring reliable performance even in high-temperature processing environments. The incorporation of lithium enhances ionic mobility, while silicon and phosphate elements contribute to the material’s mechanical strength and resistance to degradation. Additionally, its low electronic conductivity helps prevent self-discharge in electrochemical systems, and its consistent sputtering behavior guarantees uniform thin film deposition. Lithium Silicon Phosphate Target Properties Material: LiSiPO₄ Purity: 99.9% Shape: Planar Disc Note: The provided product details are based on theoretical data. For precise formulations and specific requirements, please contact us. Size: Customizable Lithium Silicon Phosphate Target Applications Solid-State Lithium-Ion Batteries: Serves as a reliable solid electrolyte material, enhancing ionic conductivity and overall battery performance. Thin Film Deposition: Facilitates advanced battery research, including microbatteries and other energy storage devices. Electrochemical Coatings: Ideal for applications requiring stable lithium-containing films in various electrochemical and ceramic coating technologies. Energy Storage Systems: Essential for developing high-performance energy storage solutions in portable electronics, electric vehicles, and renewable energy platforms. Lithium Silicon Phosphate Target Packaging Our Lithium Silicon Phosphate Targets are meticulously packaged to ensure their integrity during transit and storage. Depending on the size, smaller targets are securely housed in polypropylene (PP) boxes, while larger targets are shipped within custom wooden crates. We prioritize customized packaging solutions and utilize appropriate cushioning materials to provide maximum protection. Packaging Options: Carton Wooden Crate Custom Packaging Manufacturing Process Manufacturing Workflow Testing Methods Chemical Composition Analysis: Confirm material purity and accurate composition using techniques like Glow Discharge Mass Spectrometry (GDMS) or X-ray Fluorescence (XRF). Mechanical Properties Testing: Evaluate tensile strength, yield strength, and elongation to determine material performance under stress. Dimensional Inspection: Measure thickness, diameter, and other dimensions to ensure compliance with specified tolerances. Surface Quality Inspection: Detect defects such as scratches, cracks, or inclusions through visual and ultrasonic examinations. Hardness Testing: Assess material hardness to ensure uniformity and mechanical reliability. Frequently Asked Questions Q1: What is the primary application of the Lithium Silicon Phosphate Target (LiSiPO₄)? A1: The Lithium Silicon Phosphate Target (LiSiPO₄) is primarily utilized as a solid electrolyte material in solid-state lithium-ion batteries and for thin-film battery research, enhancing ionic conductivity and chemical stability. Q2: What benefits does LiSiPO₄ offer as a target material? A2: LiSiPO₄ provides high ionic conductivity, excellent thermal and chemical stability, and facilitates uniform lithium diffusion in solid-state applications, making it highly effective for advanced energy storage solutions. Q3: Are LiSiPO₄ targets available in different sizes and purities? A3: Yes, at SAM (Stanford Advanced Materials), LiSiPO₄ targets can be customized in terms of dimensions, shape, and purity to meet specific research or production needs. Performance Comparison: LiSiPO₄ vs. Competing Materials Property Lithium Silicon Phosphate (LiSiPO₄) LiMn₂O₄ (Standard) High-Entropy LiMn₂O₄ (EI-LMO) LiNi₀.₅Mn₁.₅O₄ (LNMO) LiFePO₄ LiCoO₂ Working Voltage (V vs. Li/Li⁺) 3.8 4.0 4.0 4.7 3.4 3.8 Specific Capacity (mAh/g) 140-160 123.5 (initial) 120-130 130-140 150-170 140-160 Cyclic Stability (Capacity Retention) ~80% @500 cycles 73.68% @50 cycles 80% @1000 cycles (10C rate) Low (requires ionic liquid electrolytes) >95% @500 cycles ~80% @500 cycles Li⁺ Diffusion Coefficient (cm²/s) ~1×10⁻¹¹ ~1×10⁻¹⁰ ~5×10⁻¹⁰ ~3×10⁻¹¹ ~1×10⁻¹⁴ ~1×10⁻¹¹ Crystal Structure Orthorhombic Spinel Spinel Spinel Olivine Layered Cost Medium Low Medium High Low Very High Raw Materials Information Lithium (Li) Symbol: Li Atomic Number: 3 Category: Alkali Metal Appearance: Soft, silvery-white metal Properties: Lithium is the lightest metal and one of the most reactive elements. It is highly flammable and reacts vigorously with water to produce lithium hydroxide and hydrogen gas. Due to its low atomic mass and high electrochemical potential, lithium is crucial in energy storage systems, particularly in lithium-ion and lithium-polymer batteries. Additionally, it is utilized in ceramics, glass manufacturing, aerospace alloys, and nuclear fusion processes. Uses: Essential for producing lithium-ion batteries used in mobile phones, laptops, electric vehicles, and renewable energy storage. It is also employed in pharmaceuticals for treating bipolar disorder and in alloy production for aircraft components. Silicon (Si) Symbol: Si Atomic Number: 14 Category: Metalloid Appearance: Shiny, blue-gray crystalline solid Properties: Silicon is the second most abundant element in the Earth’s crust and is renowned for its exceptional electrical properties, making it indispensable in the semiconductor and solar cell industries. In ceramics and battery materials, silicon enhances structural stability and electrochemical performance. Uses: Widely used in the production of semiconductors, solar cells, ceramics, glass, and as a reinforcing agent in polymer composites. In battery technology, silicon contributes to higher energy densities and improved cycle life. Phosphorus (P) Symbol: P Atomic Number: 15 Category: Non-metal Appearance: Exists in several allotropes, including white, red, and black phosphorus. White phosphorus is a waxy solid, while red phosphorus is more stable and powdery. Properties: Phosphorus is highly reactive, especially white phosphorus, which ignites spontaneously in air. It is essential for life, being a key component of DNA, RNA, and ATP. In material science, phosphorus enhances ionic conductivity and forms stable phosphate structures, particularly in solid electrolytes and cathode materials. Uses: Primarily used in fertilizers to promote plant growth. It is also a component in flame retardants, pesticides, and the production of phosphoric acid for various industrial applications. White phosphorus is utilized in military applications such as smoke screens and incendiary devices.

Aluminum Nitride Sputtering Target Description Aluminum nitride sputtering target from Stanford Advanced Materials is a ceramic sputtering material with the formula AlN. Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty. Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty. Aluminum Nitride Sputtering Target Specification Compound Formula AlN Appearance White to pale yellow powder Melting Point 2200 °C Boiling Point 2517 °C Density 2.9 to 3.3 g/cm3 Electrical Resistivity 10 to 12 10x Ω-m Specific Heat 780 J/kg-K Aluminum Nitride Sputtering Target Packaging Our aluminum nitride sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Boron Nitride (BN) Sputtering Target High Purity BN Ceramics for Thin-film Application Stanford Advanced Materials (SAM) supplies high-purity boron nitride (BN) sputtering targets engineered for stable, high-efficiency thin film deposition. BN is a ceramic compound known for its exceptional thermal stability, electrical insulation, and non-stick properties, making it an ideal material for a wide range of advanced coating applications. Our BN sputtering targets are offered in standard and customized dimensions, with optimized microstructure and density to ensure low particle generation and excellent film uniformity. Boron Nitride Sputtering Target Specification Property Value Material Boron Nitride (BN) Appearance White, crystalline solid Purity 99.5%, 99.9% Melting Point ~3,000 °C Theoretical Density 2.25 g/cm³ Sputtering Method RF, RF-R Bonding Options Indium, Elastomer Recommended Bonding Elastomer (for thermal shock resistance) Custom Sizes Dia. 1″–6″, Thick. 0.125″–0.25″ Note: BN is a non-conductive ceramic and must be sputtered using RF power. It may decompose under aggressive conditions; use in reactive atmospheres is preferred. Boron Nitride (BN) Sputtering Target Applications Boron nitride sputtering targets are used in: Semiconductor & Insulating Layers Ideal for gate dielectrics, passivation layers, and insulating films in IC and MEMS fabrication. Display & LED Devices Optical and thermal barrier coatings in OLED, LCD, and laser diode manufacturing. Photovoltaics & Transparent Electronics UV-resistant, thermally stable dielectric barriers. High-Temperature Coatings Protective layers for crucibles, tools, and components operating above 1,500 °C. Nanotechnology BN nanotubes and 2D h-BN layers offer high mechanical strength and thermal conductivity for next-gen devices. Boron Nitride (BN) Sputtering Target Bonding Services BN targets are typically bonded before installation to prevent cracking during sputtering. We offer: Elastomer Bonding – Recommended for BN due to its brittleness and low thermal conductivity. Indium Bonding – Optional, but use caution with high-temperature cycling. Custom Backing Plates – Available in copper, molybdenum, stainless steel, and more. Boron Nitride (BN) Sputtering Target Packaging Each boron nitride target is vacuum-sealed and securely packaged with foam inserts in a clean environment to prevent contamination and mechanical damage. All shipments include full labeling and traceability.

Chromium Nitride Sputtering Target Description Chromium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula Cr2N. Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty. Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty. Chromium Nitride Sputtering Target Packaging Our chromium nitride sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Germanium Nitride Sputtering Target Description Germanium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula Ge3N4. Germanium is a chemical element originated from Germany (with the Latin name Germania). It was first mentioned in 1886 and observed by A. Winkler. “Ge” is the canonical chemical symbol of germanium. Its atomic number in the periodic table of elements is 32 with a location at Period 4 and Group 14, belonging to the p-block. The relative atomic mass of germanium is 72.64(1) Dalton, the number in the brackets indicating the uncertainty. Nitrogen is a chemical element originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty. Germanium Nitride Sputtering Target Application The germanium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Germanium Nitride Sputtering Target Packaging Our germanium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Iron Nitride Sputtering Target Description Iron Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula FeN4. Iron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty. Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty. Iron Nitride Sputtering Target Application The iron nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Iron Nitride Sputtering Target Packaging Our iron nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Hafnium Nitride Sputtering Target Description Hafnium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula HfN. Hafnium is a chemical element that originated from Copenhagen, Denmark (with the Latin name Hania). It was first mentioned in 1911 and observed by G. Urbain and V. Vernadsky. The isolation was later accomplished and announced by D. Coster and G. von Hevesy. “Hf” is the canonical chemical symbol of hafnium. Its atomic number in the periodic table of elements is 72 with the location at Period 6 and Group 4, belonging to the d-block. The relative atomic mass of hafnium is 178.49(2) Dalton, the number in the brackets indicating the uncertainty. Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty. Hafnium Nitride Sputtering Target Application The hafnium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Hafnium Nitride Sputtering Target Packaging Our hafnium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.