Neodymium Aluminate Sputtering Target Description The Neodymium Aluminate Sputtering Target is composed of neodymium, aluminum, and oxygen. High-purity neodymium aluminate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Neodymium Aluminate Sputtering Target Specification Material Type Neodymium Aluminate Symbol NdAlO3 Color/Appearance Light gray target Melting Point 2233 °C Density 6.7-7.14 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Neodymium Aluminate Sputtering Target Application The Neodymium Aluminate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Neodymium Aluminate Sputtering Target Packaging Our Neodymium Aluminate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Neodymium Copper Oxide Sputtering Target Description The Neodymium Copper Oxide Sputtering Target is composed of neodymium, copper, and oxygen. High-purity neodymium copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Neodymium Copper Oxide Sputtering Target Specification Material Type Neodymium Copper Oxide Symbol Nd2CuO4 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Neodymium Copper Oxide Sputtering Target Application The Neodymium Copper Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Neodymium Copper Oxide Sputtering Target Bonding Services Target Bonding Service is available for Neodymium Copper Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Neodymium Copper Oxide Sputtering Target Packaging Our Neodymium Copper Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Nickel Ferrite Sputtering Target Description Nickel ferrite sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ni and Fe. Nickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty. Iron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty. Nickel Ferrite Sputtering Target Specification Material Type Nickel Ferrite Symbol NiFe2O4 Color/Appearance Gray solid Melting Point N/A Density 5.4 g/cm3 Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Nickel Ferrite Sputtering Target Packaging Our nickel ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Potassium Niobate Sputtering Target Description Potassium Niobate Sputtering Target is composed of potassium, niobium, and oxygen with the chemical formula of KNbO3. High-purity potassium niobate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Potassium Niobate Sputtering Target Specification Material Type Potassium Niobate Symbol KNbO3 Color/Appearance Solid Melting Point ≈ 1100 °C Density 4.640 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Potassium Niobate Sputtering Target Application The Potassium Niobate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Potassium Niobate Sputtering Target Bonding Services Target Bonding Service is available for Potassium Niobate Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Packaging of Potassium Niobate Sputtering Target Our Potassium Niobate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Praseodymium Cerium Manganate Sputtering Target Description Praseodymium Cerium Manganate Sputtering Target is composed of praseodymium, cerium, manganese, and oxygen. High-purity praseodymium cerium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Praseodymium Cerium Manganate Sputtering Target Specification Material Type Praseodymium Cerium Manganate Symbol Pr(1-x)CexMnO3 Color/Appearance Solid Melting Point / Density / Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Praseodymium Cerium Manganate Sputtering Target Application Praseodymium Cerium Manganate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Praseodymium Cerium Manganate Sputtering Target Bonding Services Target Bonding Service is available for Praseodymium Cerium Manganate Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Praseodymium Cerium Manganate Sputtering Target Packaging Our Praseodymium Cerium Manganate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Samarium Cerium Copper Oxide Sputtering Target Description Samarium Cerium Copper Oxide Sputtering Target is composed of samarium, cerium, copper, and oxygen. High-purity samarium cerium copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Samarium Cerium Copper Oxide Sputtering Target Specification Material Type Samarium Cerium Copper Oxide Symbol Sm(1-x)CexCuO4 Color/Appearance Gray Solid Melting Point / Density / Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Samarium Cerium Copper Oxide Sputtering Target Application Samarium Cerium Copper Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Samarium Cerium Copper Oxide Sputtering Target Bonding Services Target Bonding Service is available for Samarium Cerium Copper Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Samarium Cerium Copper Oxide Sputtering Target Packaging Our Samarium Cerium Copper Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition

Samarium Copper Oxide Sputtering Target Description Samarium Copper Oxide Sputtering Target is composed of samarium, copper, and oxygen. High-purity samarium copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Samarium Copper Oxide Sputtering Target Specification Material Type Samarium Copper Oxide Symbol SmCuO4 and Sm2CuOx Color/Appearance Solid Melting Point / Density / Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Samarium Copper Oxide Sputtering Target Application Samarium Copper Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Samarium Copper Oxide Sputtering Target Bonding Services Target Bonding Service is available for Samarium Copper Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Samarium Copper Oxide Sputtering Target Packaging Our Samarium Copper Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Sodium Niobate Sputtering Target Description Sodium Niobate Sputtering Target is composed of sodium, niobium, and oxygen. High-purity sodium niobate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Sodium Niobate Sputtering Target Specification Material Type Sodium Niobate Symbol NaNbO3 Color/Appearance Solid Melting Point / Density 4.42 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Sodium Niobate Sputtering Target Application Sodium Niobate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Sodium Niobate Sputtering Target Packaging Our Sodium Niobate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Strontium Manganate Sputtering Target Description Strontium Manganate Sputtering Target is composed of strontium, manganese, and oxygen. High-purity strontium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Strontium Manganate Sputtering Target Specification Material Type Strontium Manganate Symbol SrMnO3 Color/Appearance Solid Melting Point / Density / Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Strontium Manganate Sputtering Target Application Strontium Manganate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Strontium Manganate Sputtering Target Packaging Our Strontium Manganate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.