메뉴 건너뛰기

Accessories and Consumables

Crucibles, Vacuum deposition targets and Materials testing fixtures

(주)연진에스텍

Production Magnetron Sputtering Sources (HV)

CTX SERIES PRODUCTION MAGNETRON SPUTTERING SOURCES


In larger 3D coating applications the CTX Series of cylindrical target magnetrons accomplishes the task in one easy step. With the sputtered flux arriving from the inner surface of the cylindrical target, this special source keeps the entire substrate surface "in the plasma" throughout the deposition for highly uniform film properties. Off-axis deposition and low damage films are easily realized. Custom built sources range from 6" to 24" ID. Targets can be machined from solid, rolled and bonded or plasma sprayed materials. Sources feature integral process gas distribution.

 

 

 

 

액세서리 및 소모품의 다른 글

문의
하기