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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 허용 오차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


Compound Target

Lanthanum Vanadium Oxide Sputtering Target, LaVO3


 

Lanthanum Vanadium Oxide Sputtering

Target Description

 

Lanthanum vanadium oxide sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material containing La, V and O.

 

Lanthanum Vanadium Oxide Sputtering Target Handling Notes

 

1. Indium Bonding is recommended for lanthanum vanadium oxide sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

2. This material has a low thermal conductivity are susceptible to thermal shock.

 

Lanthanum Vanadium Oxide Sputter Target Application

The lanthanum vanadium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

 

Lanthanum Vanadium Oxide Sputtering Target Packing

Our lanthanum vanadium oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

 

 

 

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