Lead Zirconate Titanate With Niobium Sputtering
Target Description
The lead zirconate titanate with niobium sputtering target is composed of lead, zirconium, titanium, niobium and oxygen. High-purity lead zirconate titanate with niobium sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Lead Zirconate Titanate With Niobium Sputtering Target Specification
|
Material Type |
Lead Zirconate Titanate With Niobium |
|
Symbol |
PbZr 0.52Ti 0.48O3 |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Lead Zirconate Titanate With Niobium Sputtering Target Application
The lead zirconate titanate with niobium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Lead Zirconate Titanate With Niobium Sputtering Target Packaging
Our lead zirconate titanate with niobium sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.