Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Chromium Oxide Sputtering Target, Cr2O3
Chromium Oxide Sputtering Target
Description
Chromium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Cr2O3.
Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with the location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.
It is widely used in the automobile industry to form a shiny coating found on wheels and bumpers. Chromium is used in many vacuum applications such as automotive glass coatings, photovoltaic cell fabrication, battery fabrication, and decorative and corrosion-resistant coatings.
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Chromium Oxide Sputtering Target Specification
|
Material Type |
Chromium Oxide |
|
Symbol |
Cr2O3 |
|
Color/Appearance |
Green, Crystalline Solid |
|
Melting Point |
2,266℃ |
|
Sputter |
RF, RF-R |
|
Type of Bond |
Indium, Elastomer |
|
Comments |
Disproportionates to lower oxides; reoxidizes at 600°C in air. |
|
Available Sizes |
Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Chromium Oxide Sputtering Target Bonding
Target bonding service is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. Indium Bonding and Elastomeric Target Bonding Service are available for chromium oxide Cr2O3 sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Chromium Oxide Sputtering Target Packaging
Our chromium oxide sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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