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MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Gas Sources

Gas Sources

 

HABS Hydrogen Atom Beam Source

HABS 40 Hydrogen atom Beam Source on DN40CF (O.D. 2.75") flange

 
  • H2 dissociation typically 80-98%, depending on operation conditions
  • Atomic hydrogen flux density up to 1*1016/(cm2 s)
  • No high-energy particles and ions
  • Low power consumption (P < 200 W)
  • Integrated water cooling, low thermal load on other experimental equipment
  • Integrated shutter optional
  • Additional customized aperture and leak valve available

Data Sheet

 

OBS Oxygen Atom Beam Source

OBS 40 Oxygen Atom Beam Source on DN40CF (O.D. 2.75") flange with aperture plate

 
  • O2 dissociation up to more than 80%, depending on operation conditions
  • Atomic oxygen flux density up to 1x1015/cm2 s
  • No high-energy particles and ions
  • Low power consumption
  • Integrated water cooling, low thermal load on other experimental equipment
  • Optional customized aperture 

Data Sheet

 

FMP Free Microplasma Source

FMP 40 Free Microplasma Source with optional gas supply on DN40CF (O.D. 2.75") flange

 
  • N2 + O2 version on DN40CF flange; DN63CF flange size with ion sensor option
  • Typical operation power and frequency: 5 - 20 W / 2.5 GHz
  • Typical gas flow : 1 to 10 sccm
  • Suitable for different gas types ( for example N2, H2 or O2)
  • Additional equipment / options: all-metal valve, gas supply, RF generator, ion sensor, photo diode

Data Sheet

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