Cerium Sputtering Target
Specification
|
Material Type |
Cerium |
|
Symbol |
Ce |
|
Color/Appearance |
Silvery White, Metallic |
|
Melting Point |
798°C |
|
Density |
~6.70g/cc |
|
Thermal Conductivity |
1 W/m.K |
|
Coefficient of Thermal Expansion |
6.3 x 10-6/K |
|
Available Sizes |
Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Cerium Sputtering Target Description
Stanford Materials Corporation (SMC) specializes in supplying high quality sputtering targets. SMC can offers a full line of sputtering targets with various compositions from industrial grade to super high purity. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.
|
Purity |
>99.9% |
|
Shape |
Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made |
|
Size |
Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
Cerium Sputtering Target Application
Cerium sputtering target has the following applications:
• Use to manufacture aluminum alloys and in some steels and irons.
• In cast iron, opposes graphitization and produces a malleable iron
• In steels, it removes sulfides and oxides and completely detoxifies.
• In stainless steel, it is used as a precipitation-hardening agent.