Erbium (Er) Sputtering Targets
Description
Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We provide high purity metal, metal alloy and ceramic sputtering targets in more than 500 compositions. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.
Erbium (Er) Sputtering Targets Specification
|
Purity |
99.9% |
|
Shape |
Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made |
|
Size |
Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm |