Erbium Fluoride Sputtering Target 

Description

Erbium fluoride sputtering target is a fluoride ceramic sputtering target composed of erbium and fluorine.

Erbium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1842 and observed by G. Mosander. “Er” is the canonical chemical symbol of erbium. Its atomic number in the periodic table of elements is 68 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of erbium is 167.259(3) Dalton, the number in the brackets indicating the uncertainty.

Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.

Erbium Fluoride Sputtering Target Application

The erbium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Erbium Fluoride Sputtering Target Packing

Our erbium fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.