High Purity MgF2 Sputter Targets for Thin-film

Application

Stanford Advanced Materials (SAM) supplies high-purity magnesium fluoride sputtering targets for optical and electronic thin-film applications. With excellent UV transmission and chemical stability, MgF₂ is ideal for coatings that require high transparency and environmental resistance.

Magnesium Fluoride Sputtering Target Specification

Substrate temperature and deposition rate should be carefully controlled to ensure coating quality and target longevity.

Product Description

Magnesium Fluoride (MgF₂) is a durable, transparent ceramic material widely used in optical coatings due to its high transmission from vacuum UV to the infrared spectrum (~120 nm–8 µm). It is naturally found as the mineral sellaite. MgF₂ thin films are used in laser optics, space optics, antireflective coatings, and semiconductor passivation layers.

This sputtering target is precisely engineered for stable and uniform thin-film deposition, ideal for both reactive and non-reactive RF sputtering systems.

Applications

Magnesium fluoride sputtering targets are widely used in:

• Optical Coatings – UV lenses, IR windows, camera optics

• Semiconductors – Passivation and protective dielectric layers

• Displays & LEDs – Light outcoupling and anti-glare coatings

• Photovoltaics – Transparent insulating layers

• Space and Aerospace Optics – Telescopic and sensor coatings

Bonding Services

SAM offers two bonding options to optimize thermal and mechanical performance:

• Indium Bonding – Best for low thermal stress and temporary bonding

• Elastomer Bonding – Recommended for brittle ceramics like MgF₂ to absorb thermal expansion stress

We also machine standard or custom backing plates (e.g., Mo, Cu, SS) to support your specific sputtering system.

Packaging & Quality

• Vacuum-sealed and foam-protected for maximum safety

• Clearly labeled with batch number and certificate of analysis

• Shipped in anti-static, cleanroom-compatible containers