High Purity Magnesium Oxide Sputtering Target for Thin-film Coating

Magnesium Oxide Sputtering Target Specification

Material Properties

Available Sizes & Options

Handling Note: MgO is brittle and has low thermal conductivity. We strongly recommend using mechanical clamping or our elastomer bonding service to prevent thermal shock and fracturing during use.

Magnesium Oxide Sputtering Target Applications

Magnesium oxide sputtering targets are used in a wide range of thin-film applications where insulating, transparent, or thermally resistant layers are required:

• Semiconductor Devices
  Gate dielectrics, barrier layers, and insulating films in transistor structures

• Optical Coatings
  Anti-reflective layers, UV filters, and dielectric mirrors for high-precision optics

• Magnetic Storage Media
  Protective and insulating layers in hard disk and magnetic recording devices

• Electronics & Displays
  Thin insulating coatings in LCDs, OLEDs, and other flat panel devices

• Superconductors & Buffer Layers
  Used as a stable substrate or buffer layer for YBCO and other epitaxial thin films

Magnesium Oxide Sputtering Target Bonding Services

Due to MgO’s mechanical fragility, elastomer bonding is recommended for most applications. This flexible interface helps reduce stress transfer and cracking. SAM also offers:

• Custom bonding configurations

• Machined backing plates (e.g., Mo, CuCrZr)

• Mechanical clamping assistance if bonding is not used

Magnesium Oxide Sputtering Target Packaging & Handling

All of our MgO targets are vacuum-sealed and protected with anti-static foam to prevent contamination and mechanical damage in transit. Full traceability and stock control are ensured by clear labeling.