Praseodymium Calcium Manganate Sputtering Target Description Praseodymium calcium manganate sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material containing Pr, Ca, Mn and O. Praseodymium Calcium Manganate Sputtering Target Packaging Our praseodymium calcium manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Packaging of Praseodymium Nickel Oxide Sputtering Target Our Praseodymium Nickel Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Description of Zinc Oxide with Scandia Sputtering Target Stanford Materials Corporation (SMC) specialize in producing high purity Zinc Oxide with Scandia Sputtering Target with the highest possible density and smallest possible average grain sizes. Zinc Oxide with Scandia Sputtering Target Packaging Our Zinc Oxide with Scandia Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Erbium (Er) Sputtering Targets Description Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We provide high purity metal, metal alloy and ceramic sputtering targets in more than 500 compositions. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization. Erbium (Er) Sputtering Targets Specification Purity 99.9% Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Praseodymium (Pr) Sputtering Targets Description Stanford Materials Corporation (SMC) provides a full range of sputtering target materials including precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides, and fluorides. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry-leading sputtering targets. With a large purchasing and production capacity, SMC can supply sputtering targets with high quality at very competitive prices. Praseodymium (Pr) Sputtering Targets Specification Purity 99.9% Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Cerium Sputtering Target Specification Material Type Cerium Symbol Ce Color/Appearance Silvery White, Metallic Melting Point 798°C Density ~6.70g/cc Thermal Conductivity 1 W/m.K Coefficient of Thermal Expansion 6.3 x 10-6/K Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Cerium Sputtering Target Description Stanford Materials Corporation (SMC) specializes in supplying high quality sputtering targets. SMC can offers a full line of sputtering targets with various compositions from industrial grade to super high purity. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization. Purity >99.9% Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm Cerium Sputtering Target Application Cerium sputtering target has the following applications: • Use to manufacture aluminum alloys and in some steels and irons. • In cast iron, opposes graphitization and produces a malleable iron • In steels, it removes sulfides and oxides and completely detoxifies. • In stainless steel, it is used as a precipitation-hardening agent.

Europium Sputtering Target Specification Material Type Europium Symbol Eu Color/Appearance Silvery White, Metallic Melting Point 822 °C Density 5.26 g/cc Comments Low Ta solubility. Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Europium Sputtering Target Application Europium sputtering target is used for thin film deposition. Europium is being studied for use in nuclear control applications. Europium oxide is extensively utilized as a phosphor activator. Europium-activated yttrium vanadate is commercially used as a red phosphor in color television tubes. Europium-doped plastics are utilized as laser materials.

Holmium Sputtering Target Specification Material Type Holmium Symbol Ho Color/Appearance Silvery White, Metallic Melting Point 1,474°C Density 8.8 g/cc Thermal Conductivity 16 W/m.K Coefficient of Thermal Expansion 11.2 x 10-6/K Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Holmium Sputtering Target Application Holmium sputtering target is used for thin film deposition. Holmium is used as a dopant in glass and optical fibers Packing Our holmium sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Lanthanum Sputtering Target Specification Material Type Lanthanum Symbol La Color/Appearance Solid Melting Point 927 °C Type of Bond / Density 7.3 g/cc Thermal Conductivity 6.17 W/m.K Coefficient of Thermal Expansion 12.1 x 10-6/K Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 12.1 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Lanthanum Sputtering Target Description Stanford Materials Corporation (SMC) is a market-leading manufacturer and supplier of sputtering targets and thin film coating materials. SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product. Purity 99.9% Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm Lanthanum Sputtering Target Application The lanthanum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Major applications of lanthanum include: An alloying agent for steels and cast irons Hybrid car batteries In cigarette lighter flints in the form of Mischmetal (an alloy primarily consisting of cerium and lanthanum) Carbon arc lighting used in mation pictures, studio lighting and projection Packaging Our lanthanum sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.