Barium Niobate Sputtering Target Description

Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty.

Niobium is a chemical element originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand. “Nb” is the canonical chemical symbol of niobium. Its atomic number in the periodic table of elements is 41 with location at Period 5 and Group 5, belonging to the d-block. The relative atomic mass of niobium is 92.906 38(2) Dalton, the number in the brackets indicating the uncertainty.  

Barium Niobate Sputtering Target Application

The  barium niobate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Barium Niobate Sputtering Target Packaging

Our barium niobate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.