Nickel Iron (Ni-Fe) Sputtering Target Description

Nickel Iron (Ni-Fe) Sputtering Targets possess notable properties essential for diverse applications. Renowned for their exceptional purity, these targets play a vital role in precise thin-film deposition processes. The Nickel Iron composition ensures desirable magnetic and electrical properties, making them valuable for applications in electronics, magnetics, and sensor technologies. With excellent corrosion resistance, these targets contribute to the production of durable and reliable coatings. Overall, the distinctive properties of Nickel Iron Sputtering Targets make them integral in advancing various technological fields.

Nickel Iron (Ni-Fe) Sputtering Target Specifications

Nickel Iron (Ni-Fe) Sputtering Target Handling Notes

1. Indium bonding is recommended for the Nickel Iron Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Nickel Iron (Ni-Fe) Sputtering Target Application

Nickel Iron Sputtering Targets serve versatile purposes across advanced technologies. Primarily employed in thin-film deposition, these targets play a crucial role in electronics, magnetics, and sensor technologies. The exceptional purity of Nickel Iron ensures precise coating, making them vital in the production of high-performance electronic devices and sensors. Their unique magnetic and electrical properties contribute to the development of efficient components, such as magnetic storage devices. With excellent corrosion resistance, these targets find applications in creating durable and reliable coatings, establishing Nickel Iron Sputtering Targets as key materials in advancing various technological applications.

Nickel Iron (Ni-Fe) Sputtering Target Packaging

Our Nickel Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.