Niobium Carbide Sputtering Target Description Niobium is a silver-colored metal that is generally found in conjunction with tantalum, the two elements being separated by fractional crystallization of their respective fluoro-complexes. It has an abundance of 20 ppm in the earth’s crust. As a pure metal, it is very reactive and forms an extremely stable oxide when exposed to air which enhances its corrosion resistance. Niobium will react with a variety of non-metals at elevated temperatures. Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty. Niobium Carbide Sputtering Target Specification Compound Formula NbC Molecular Weight 104.92 Appearance Gray Melting Point 3,490°C Boiling Point N/A Density 7.82 g/cm3 Niobium Carbide Sputtering Target Application The niobium carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Niobium Carbide Sputtering Target Packaging Our niobium carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Molybdenum Carbide Sputtering Target Description Molybdenum is a chemical element that originated from the Greek ‘molybdos’ meaning lead. It was first mentioned in 1778 and observed by W. Scheele. The isolation was later accomplished and announced by J. Hjelm. “Mo” is the canonical chemical symbol of molybdenum. Its atomic number in the periodic table of elements is 42 with a location at Period 5 and Group 6, belonging to the d-block. The relative atomic mass of molybdenum is 95.94(2) Dalton, the number in the brackets indicating the uncertainty. Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty. Molybdenum Carbide Sputtering Target Specification Compound Formula Mo2C Molecular Weight 203.89 Appearance Gray Melting Point 2690 °C Boiling Point N/A Density 9.18 g/cm3 Molybdenum Carbide Sputtering Target Application The molybdenum carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Molybdenum Carbide Sputtering Target Packaging Our molybdenum carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Iron Carbide Sputtering Target Description Iron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty. Carbon is a chemical element originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty. Iron Carbide Sputtering Target Specification Compound Formula Fe3C Molecular Weight 179.55 Appearance Solid Appearance 1227 °C (2241 °F) Density 7.694 g/cm3 Iron Carbide Sputtering Target Packing Our iron carbide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Chromium Carbide Sputtering Target Description Chromium Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula Cr3C2. Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty. Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty. Chromium Carbide Sputtering Target Specification Compound Formula C2Cr3 Molecular Weight 180.01 Appearance Gray Melting Point 1,895℃ Boiling Point N/A Density 6.68 g/cm3 Chromium Carbide Sputtering Target Application The chromium carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Chromium Carbide Sputtering Target Packaging Our chromium carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Boron Carbide Sputtering Target Description Boron is a chemical element that originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. Thénard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with a location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty . Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty. Boron Carbide Sputtering Target Handling Notes 1. Indium bonding is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. Boron Carbide Sputtering Target has a low thermal conductivity and is susceptible to thermal shock. Boron Carbide Sputtering Target Application The boron carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Boron Carbide Sputtering Target Packaging Our boron carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

We offers high-purity aluminum oxide (Al₂O₃) sputtering targets, also known as alumina sputtering targets, for thin film deposition via RF magnetron sputtering. As a chemically stable, wide-bandgap ceramic material, Al₂O₃ is ideal for use in insulating, dielectric, and optical coatings. Our alumina targets are fabricated with high density and ultra-fine microstructure, ensuring low arcing, stable deposition rates, and uniform thin film quality. Aluminum Oxide Sputtering Target Specification Property Value Compound Aluminum Oxide (Al₂O₃) Appearance White, crystalline solid Purity Options 99.9%, 99.95%, 99.99% Melting Point 2,072 °C Theoretical Density 3.97 g/cm³ Z Ratio 0.336 Sputtering Method RF, RF-R Available Sizes Dia. 1″–6″, Thick. 0.125″–0.25″ Bonding Methods Indium (standard), Elastomer Custom Shapes Available upon request Note: Al₂O₃ is an electrical insulator and requires RF sputtering systems. Aluminum Oxide Sputtering Target Application Aluminum oxide sputtering targets are widely used in: Semiconductor Devices Gate dielectrics, passivation layers, and diffusion barriers. Display & LED Coatings Transparent dielectric films for TFTs, OLEDs, and LEDs. Photovoltaics Surface passivation and insulating layers in solar cells. Protective Optical Coatings High-durability layers for lenses, mirrors, and AR coatings. Decorative & Anti-corrosive Films Durable oxide films for consumer electronics and automotive trim. Aluminum Oxide Sputtering Target Bonding Methods Al₂O₃ targets are brittle ceramic materials and are typically bonded for secure operation in high-power systems. We offer: Indium Bonding – High thermal conductivity, easy to remove Elastomer Bonding – Flexible interface for stress-sensitive systems Custom backing plates – Copper, molybdenum, stainless steel available Packaging All alumina targets are cleanroom-packaged, sealed against moisture, and foam-protected to prevent cracking or contamination. Batch COA and purity certificates are provided with every shipment.

Lithium Lanthanum Zirconate Sputtering Target Description Lithium lanthanum zirconate sputtering target is a silver sputtering material with the element Li, La, Zr and O. It is a conductive ceramic solid electrolyte material for lithium-ion batteries. Lithium Lanthanum Zirconate Sputtering Target Specification Material Type Lithium Lanthanum Zirconate Symbol LLZO Color/Appearance Silver Solid Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Lithium Lanthanum Zirconate Sputtering Target Packing Our lithium lanthanum zirconate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Packaging of Lanthanum Lithium Titanate Sputtering Target Our Lanthanum Lithium Titanate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Packaging of Cerium Bismuth Ferrite Sputtering Target Our Cerium Bismuth Ferrite Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.