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Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.



 

Germanium Antimony Selenium Tellurium Sputtering Target Description

 

Precision-engineered from top-tier materials, Germanium-Antimony-Selenium-Tellurium (GeSbSeTe) Sputtering Targets provided by Stanford Advanced Materials (SAM) assure exceptional performance and reliability.

With a unique composition encompassing Germanium, Antimony, Selenium, and Tellurium, these targets exhibit outstanding electrical conductivity, a high melting point, and remarkable chemical stability. Additionally, their high refractive index makes them ideal for diverse optical applications. Backed by our commitment to excellence, trust that these targets will optimize your thin-film deposition processes to the fullest.

 

 

Germanium Antimony Selenium Tellurium Sputtering Target Specifications

Compound Formula

GeSbSeTe

Appearance

Silvery gray metallic Target

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Germanium Antimony Selenium Tellurium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Germanium Antimony Selenium Tellurium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Germanium Antimony Selenium Tellurium Sputtering Target Application

  1. Optical Storage Device Manufacturing: Due to the special electrical properties and excellent chemical stability, Germanium Antimony Selenium Tellurium Sputtering Targets are widely used in the manufacturing of optical storage devices, such as optical discs and phase change memories.
  2. Phase Change Memory: GeSbSeTe, as a key material for phase change memory, enables high-density, fast information storage and reading/writing in electronic devices.
  3. Optical Coatings: Due to their high refractive index, Germanium Antimony Selenium Tellurium Sputtering Targets are used in the preparation of optical coatings, and are particularly suitable for the manufacture of films with special optical properties.
  4. Semiconductor Industry: Germanium Antimony Selenium Tellurium Sputtering Targets also play an important role in semiconductor manufacturing, where they are used in thin film deposition processes to prepare high-performance films for use in electronic devices.

 

Germanium Antimony Selenium Tellurium Sputtering Target Packaging

Our Germanium Antimony Selenium Tellurium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


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