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Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.



 

Germanium Antimony Sputtering Target

Description

 

Germanium Antimony Sputtering Target is a material used in the sputtering process, which is a technique for depositing thin films onto a substrate in various technological applications. These thin films may have applications in various fields, including electronics and optoelectronics.

Germanium Antimony thin films are known for their applications in phase change memory devices. The unique properties of germanium antimony alloys make them suitable for use in non-volatile memory technologies. Germanium Antimony thin films may find applications in optoelectronic devices, such as sensors, detectors, and other components where the properties of germanium antimony alloys are advantageous. SAM’s Germanium Antimony Sputtering Targets fulfil the demands of both research scientists and manufacturing professionals.

 

 

Germanium Antimony Sputtering Target Specifications

Compound Formula

Ge-Sb

Appearance

Silver Metallic Target

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Germanium Antimony Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Germanium Antimony Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Germanium Antimony Sputtering Target Application

In the field of microelectronics, Germanium Antimony Sputtering Targets are used to create coatings for semiconductors and other microelectronic devices. The high electrical conductivity and chemical stability of these targets make them ideal for use in transistors, diodes, and other electronic components. The coatings can serve as conductors or dielectrics, depending on their composition, and help improve the performance and reliability of these devices.

In optics, Germanium Antimony Sputtering Targets are used to create coatings for optical components such as lenses and mirrors. The high refractive index and excellent optical properties of these targets make them suitable for a range of optical applications, including imaging, spectroscopy, and laser technology.

In solar energy, Germanium Antimony Sputtering Targets are used to create coatings for solar cells. The high absorption coefficient of these targets makes them efficient in converting sunlight into electricity. The coatings can be used as anti-reflective layers to increase the absorption of sunlight by the solar cells, thereby improving their efficiency.

In addition to these applications, Germanium Antimony Sputtering Targets are also used in research and development. The properties of these targets make them suitable for fundamental research on thin-film deposition processes and the study of their physical and chemical properties.

 

Germanium Antimony Sputtering Target Packaging

Our Germanium Antimony Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 

 

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


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