Sputtering Targets

Home > 진공박막증착재료 > 스퍼터링 타겟

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.

OXIDE TARGET

Lithium Niobate Sputtering Target, LiNbO3

2025-11-03 14:13:05 110

High Purity Lithium Niobate for Advanced Thin Film Applications

Lithium Niobate Sputtering Target Specification

Material	Lithium Niobate (LiNbO₃)
Color	White crystalline solid
Purity	>99.9%
Density	4.638 g/cm³
Sputter Type	RF, RF-R
Available Diameters	1.0″ to 6.0″
Available Thickness	0.125″, 0.250″
Bonding Options	Indium Bonding, Elastomer Bonding
Notes	Custom shapes/sizes available

For non-standard dimensions or custom target shapes, please send an inquiry.

Lithium Niobate Sputtering Target Applications

Lithium niobate sputtering targets are used for RF magnetron sputtering in a wide range of advanced technologies:

Telecommunications
Thin film deposition for optical waveguides, optical modulators, and mobile device components.
Photonic & Optoelectronic Devices
Integrated optics, nonlinear optical components, and frequency doubling (SHG) devices.
Semiconductors & MEMS
Ferroelectric and piezoelectric thin films in microelectromechanical systems (MEMS).
Lasers & Q-Switches
Pockels cells, Q-switches, optical parametric oscillators, and modulators.
Advanced Coatings
Transparent, high-dielectric coatings for displays, LEDs, and precision optics.

Packaging & Quality Control

All lithium niobate sputtering targets are individually vacuum-sealed, shock-protected, and clearly labeled. Each shipment includes full documentation and undergoes rigorous quality checks for dimension, density, and purity.