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Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.



 

Platinum Iridium Sputtering Target Description

 

Platinum Iridium Sputtering Target is a material used in the sputtering deposition process. Sputtering is a widely used technique in thin film deposition, where atoms or ions are ejected from a solid target material and deposited onto a substrate to form a thin film.

Platinum Iridium Sputtering Target features excellent corrosion resistance, high melting point, and good electrical conductivity. The alloy is often used in applications that require high-temperature stability, such as thermocouples, electrical contacts, and biomedical devices.

 

 

Platinum Iridium Sputtering Target Specifications

Compound Formula

Pt-Ir

Molecular Weight

387.3

Appearance

Silver Metallic Target

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Platinum Iridium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Platinum Iridium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Platinum Iridium Sputtering Target Application

  1. Electronic Manufacturing: Platinum Iridium Sputtering Targets are crucial in electronic manufacturing, contributing to the creation of high-performance electronic devices due to their exceptional purity and unique material composition.
  2. Advanced Materials Engineering: These targets find significance in advanced materials engineering, where their distinctive properties make them valuable in the development of innovative materials with enhanced characteristics.
  3. Nanotechnology Applications: Platinum Iridium Sputtering Targets play a crucial role in nanotechnology applications, showcasing adaptability and contributing to advancements in cutting-edge technologies.
  4. Thin-Film Deposition: Instrumental in thin-film deposition processes, these targets ensure precise and uniform coatings, serving various industrial and research applications.

 

Platinum Iridium Sputtering Target Packaging

Our Platinum Iridium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


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