Neodymium Aluminate Sputtering
Target Description
The Neodymium Aluminate Sputtering Target is composed of neodymium, aluminum, and oxygen. High-purity neodymium aluminate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Neodymium Aluminate Sputtering Target Specification
|
Material Type |
Neodymium Aluminate |
|
Symbol |
NdAlO3 |
|
Color/Appearance |
Light gray target |
|
Melting Point |
2233 °C |
|
Density |
6.7-7.14 g/cm3 |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Neodymium Aluminate Sputtering Target Application
The Neodymium Aluminate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Neodymium Aluminate Sputtering Target Packaging
Our Neodymium Aluminate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.