Manganese Cobalt Oxide Sputtering
Target Description
Manganese Cobalt Oxide Sputtering Target is composed of manganese, cobalt, and oxygen. High-purity manganese cobalt oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Manganese Cobalt Oxide Sputtering Target Specification
|
Material Type |
Manganese Cobalt Oxide |
|
Symbol |
MnCo2O4 |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Manganese Cobalt Oxide Sputtering Target Application
The Manganese Cobalt Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Manganese Cobalt Oxide Sputtering Target Bonding Services
Target Bonding Service is available for Manganese Cobalt Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Manganese Cobalt Oxide Sputtering Target Packaging
Our Manganese Cobalt Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.