Tantalum Oxide Sputtering Target Description
Tantalum is a chemical element that originated from King Tantalus, the father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with a location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty.
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Tantalum Oxide Sputtering Target Specification
|
Compound Formula |
Ta2O5 |
|---|---|
|
Molecular Weight |
441.89 |
|
Appearance |
White solid |
|
Melting Point |
1,872° C |
|
Density |
8.2 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Tantalum Oxide Sputtering Target Handling Notes
1. Indium bonding is recommended for tantalum oxide sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.
Tantalum Oxide Sputtering Target Packaging
Our tantalum oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.