Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Nickel Cobalt Sputtering Target, Ni-Co
Nickel Cobalt Sputtering Target Description
Nickel Cobalt Sputtering Targets possess distinctive properties that make them highly valuable in various technological applications. Known for their exceptional purity, these targets are crucial for precise thin-film deposition processes. The Nickel Cobalt composition ensures superior conductivity, making them ideal for advanced electronic and semiconductor manufacturing. Additionally, these targets exhibit excellent corrosion resistance, enhancing their durability and reliability in demanding environments. Their unique combination of properties makes Nickel Cobalt Sputtering Targets indispensable for cutting-edge nanotechnology applications, providing a foundation for the development of efficient and reliable electronic devices and semiconductor components.
Nickel Cobalt Sputtering Target Specifications
|
Compound Formula |
Ni-Co |
|
Appearance |
Silver Metallic Target |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Nickel Cobalt Sputtering Target Handling Notes
- Indium bonding is recommended for the Nickel Cobalt Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Nickel Cobalt Sputtering Target Application
Nickel Cobalt Sputtering Targets find diverse applications across advanced technologies. Primarily employed in thin-film deposition processes, these targets play a pivotal role in the production of electronic devices and semiconductor components. The exceptional purity of Nickel Cobalt ensures precise and efficient coating, making it vital in nanotechnology applications. Due to their superior conductivity, these targets are utilized in the manufacturing of high-performance electronic circuits and thin films. Their corrosion resistance further extends their utility in creating durable and reliable coatings. Overall, Nickel Cobalt Sputtering Targets serve as essential materials for enhancing the functionality and performance of various electronic and semiconductor devices.
Nickel Cobalt Sputtering Target Packaging
Our Nickel Cobalt Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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