Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Aluminum Manganese Sputtering Target, Al/Mn
Aluminum Manganese Sputtering Target
Description
Aluminum Manganese Sputtering Targets have some remarkable properties that allow them to excel in applications such as thin film deposition. Outstanding properties include excellent purity, ensuring reliability and a high degree of purity in the preparation of thin films. At the same time, Aluminum Manganese Sputtering Targets offer good electrical properties, making them ideal for use in areas such as the semiconductor industry. The complex combination of alloys also gives these targets superior chemical stability, allowing them to maintain excellent stability during thin film deposition. This combination of properties makes Aluminum Manganese Sputtering Targets widely used in a variety of high-tech industries, supporting the development of advanced technologies and industrial applications.
Aluminum Manganese Sputtering Target Specifications
|
Compound Formula |
Al/Mn |
|
Appearance |
Silver Metallic Target |
|
Density |
2.72g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Aluminum Manganese Sputtering Target Handling Notes
- Indium bonding is recommended for the Aluminum Manganese Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Aluminum Manganese Sputtering Target Application
- Semiconductor Industry: Due to their good electrical properties, Aluminum Manganese Sputtering Targets are widely used in the semiconductor industry for thin film deposition to prepare high-performance films for electronic components and integrated circuits.
- Optical Coatings: These targets play a key role in the preparation of optical coatings, which are used to prepare thin films with special optical properties for a wide range of optical devices and applications, such as lenses and filters.
- Magnetic Sensors: Thin films of Aluminum Manganese may be used in the manufacturing of magnetic sensors and devices, contributing to advancements in sensing technologies.
- Electronics: In the manufacture of electronic devices, these targets are used to prepare thin films to improve the performance and stability of electronic components to support various electronic applications.
Aluminum Manganese Sputtering Target Packaging
Our Aluminum Manganese Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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