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Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.



 

Nickel Gallium Sputtering Target Description

 

Nickel Gallium Sputtering Target is a crucial component in thin-film deposition processes. Composed of a high-purity alloy of nickel and gallium, this target possesses exceptional properties that make it highly sought after. It exhibits remarkable thermal stability, ensuring consistent performance even under demanding conditions. With its high electrical conductivity, it enables efficient electron transfer, making it ideal for applications in semiconductor manufacturing and electronic device fabrication. Moreover, the Nickel Gallium Sputtering Target offers excellent adhesion to substrates, resulting in durable and reliable thin films. Its versatility makes it suitable for various industries, including optical coatings and magnetic storage devices. By utilizing this target, precise and uniform film deposition is achieved, leading to the production of high-performance electronic and optical devices.

 

Nickel Gallium Sputtering Target Specifications

Compound Formula

Ni/Ga

Appearance

Silver Grey Target

Density

8.53-8.99 g/cm3

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Nickel Gallium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Nickel Gallium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Nickel Gallium Sputtering Target Application

  1. Semiconductor Manufacturing: The Nickel Gallium Sputtering Target plays an important role in semiconductor manufacturing. It can be used to prepare metal oxide films, metal stacked structures and conductive layers for the manufacture of transistors, capacitors and other electronic devices.
  2. Optical Coatings: This material is used to prepare optical coatings such as mirrors, filters and optical lenses. It has excellent optical properties and high reflectivity and can be used to improve the efficiency and performance of optical devices.
  3. Magnetic memory devices: The Nickel Gallium Sputtering Target plays a key role in the preparation of magnetic memory devices. It is used to prepare magnetic films such as read/write heads for disk drives and magnetic layers for magnetic memories.
  4. Other applications: The material is also used to prepare conductive coatings, anti-corrosion coatings and other functional coatings. It has a wide range of uses in research and applications in electronics, optics, materials science and other fields.

 

Nickel Gallium Sputtering Target Packaging

Our Nickel Gallium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 

 

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


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