To fast-track the materials of the future
COMPONENTS
TEMPERATURE GRADIENT STAGE
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The TGS is an off-the-shelf substrate holder that is able to create a temperature gradient from 500 °C to 30 °C, besides providing homogeneous temperature of up to 400 °C. The temperature gradient can be tailored to different temperature windows.
This allows the screening of new materials and processes to be done in a substantially lower number of experiments. This saves a significant amount of time in the synthesis and characterization.
The TGS can easily be operated with our manual control and recipe creator to increase or decrease the temperature at any point during the process.
CHARACTERIZATION OF ALD FILMS FROM A SINGLE DEPOSITION
ELECTRONICS AND SOFTWARE CONTROL SYSTEMS
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We provide electronics and software control systems to boost the flexibility and control of your process on existing equipment or your new home-made system.
We can integrate additional equipment or components into our software and be controlled with our recipe creator.
Mass Flow Controllers
- 4 Analog MFC
- 60 Digital MFC
Pneumatic (ALD) valves
- 24 valves
Pressure Sensors
- 4 Analog
Gate valves
- 3 gate valves with feedback
Flow meters
- 4 Flow meters
Temperature
- 16 Channel PID regulation with K-Type sensors
- 4 PT100/PT1000
Interlocks
- 8 Interlock in
- 12 Interlock out
Additional Connections
- 2 Ethernet
- 2 RS485
MICROWAVE PLASMA SOURCES & GENERATORS
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We incorporate microwave plasma sources and generators from SAIREM ❯. The self-matching plasma sources working with 2,45 GHz solid state generators are ideal for ALD and PVD processes:
・ Surface pre-treatment and cleaning
・ Microwave Plasma-Enhanced Atomic Layer Deposition (PE-ALD)
・ Microwave Plasma Assisted Reactive Sputtering (MP-ARS)
