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Accessories and Consumables

For maintenance and repair service

R&D Magnetron Sputtering Sources (HV and UHV)

OPTIONS FOR UHV & HV MAGNETRON SPUTTERING SOURCES

YEONJIN 2021-01-09 13:16:44 967

In-Situ Tilt for Optimum Uniformity

For angled sputtering configurations with rotating substrates, AJA R&D sources are typically fitted with the "in-situ tilt" option. This option, shown above, allows the source angle to be precisely adjusted from outside the vacuum chamber. Fine tuning the incident angle is critical to achieving good deposition uniformity when working distances, operating pressures and materials are changed. While fixed angle arrangements limit and in some ways compromise the capabilities of a system, "in-situ tilt" can deliver better than ± 1.5% uniformity on substrates which can be up to triple the diameter of the source targets.

A320-XP Complete Source
This shows a typical A320-XP 2" UHV source with in-situ tilt,
pneumatic shutter, gas ring, conical chimney and integral gas injection.
Deposition uniformity with an ST20 (3) source cluster flange
featuring in-situ tilt focused on a rotating,  4.0"  Ø, Si wafer.
TiN / AlN co-deposition shows < +/- 1% uniformity (ellipsometer  measurement)

 

 

 

 

 

 

 

 

 

Chimney / Gas Ring


AJA offers conical, cylindrical and high particulate versions of source chimneys. The designs generally incorporate a gas ring in the base of the chimney - sheet injection for smaller sources and individual channels for larger guns. For sources that do not tilt, chimney inserts can be used to enhance uniformity.  For ultra low rate doping applications, chimneys can be fitted with grids to reduce rates up to 95%. Surfaces are alumina grit blasted for maximum adhesion. Specialty coatings and water cooled chimneys are available for some applications. 

 

 

 

Source Shutters


AJA R&D magnetron sputter sources are available with shutters which optically seal off the opening of the source chimney. These shutters have been engineered in a variety of configurations including:

  • manual blade type
  • flip top for restricted spaces
  • linear for center mounted sources
  • magnetically actuated
  • pneumatically actuated

 

 

Modular Magnet Array and Super Magnet Pullers


AJA HV and UHV, R&D magnetron sputter sources feature modular magnet arrays which can be converted to operate in balanced, unbalanced and magnetic material modes. A variety of high strength, high temperature rare earth magnet sizes and materials are available to optimize gun performance.  A newly developed Super Magnet Puller has been developed to minimize the time required to convert magnet arrays.

 

 

 

 

UBQD - the Perfect Quick Disconnect


AJA has developed the perfect quick disconnect for mounting HV magnetron sources with 0.750" Ø support tubes through baseplate holes ranging in size from 1.0" to 34 mm in Ø. Unlike aluminum BQD's (whose threads are easily stripped) or S/S BQD's (which can easily scratch the support tube), the AJA UBQD uses a stainless body, a PTFE glide ring to protect the tube and an atmosphere side brass nut to prevent galling of the threads. It also includes an adapter ring for 32-34 mm baseplate holes and is economically priced.

 

 

 

 

AJA International Inc, Massachusetts, USA