Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Vanadium Oxide Sputtering Target, V2O3
Vanadium Oxide Sputtering
Target Description
Vanadium Oxide Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and coatings.
The sputtering target is a high-purity form of V2O3, designed to provide a controlled and precise source of vanadium(III) oxide during the thin-film deposition process.
Vanadium Oxide Sputtering Target Specifications
|
Compound Formula |
V2O3 |
|
Molecular Weight |
149.88 |
|
Appearance |
Black Target |
|
Melting Point |
1940℃ |
|
Density (g/cm3) |
4.339 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Vanadium Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for the Vanadium Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Vanadium Oxide Sputtering Target Application
Vanadium Oxide Sputtering Target is used in the fabrication of electronic devices and components.
Vanadium Oxide Sputtering Target Packaging
Our Vanadium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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