Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Lithium Nickel Oxide Sputtering Target, LiNiO2
Lithium Nickel Oxide Sputtering
Target Description
Lithium Nickel Oxide Sputtering Target is a specialized material used in the process of sputter deposition, a technique employed in thin-film manufacturing and coating applications.
Sputtering is a technique used to deposit thin films of material onto a substrate. It involves bombarding a target material with high-energy ions, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto the substrate, forming a thin film.
Lithium Nickel Oxide is a compound composed of lithium (Li), nickel (Ni), and oxygen (O) atoms. It is often used in the production of cathode materials for lithium-ion batteries. The sputtering process allows for precise control over the deposition of thin films, making it valuable in various industries, including electronics, energy storage, and optics. The use of Lithium Nickel Oxide Sputtering Targets contributes to the creation of thin films with specific properties and compositions for diverse applications.
Lithium Nickel Oxide Sputtering Target Specifications
|
Compound Formula |
LiNiO2 |
|
Molecular Weight |
97.63 |
|
Appearance |
Gray Target |
|
Melting Point |
>1000℃ |
|
Density |
– |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Lithium Nickel Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for Lithium Nickel Oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Lithium Nickel Oxide Sputtering Target Application
Lithium Nickel Oxide Sputtering Target is widely used in various industries, including electronics, energy storage, and optics.
Lithium Nickel Oxide Sputtering Target Packaging
Our Lithium Nickel Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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