Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Lanthanum Strontium Cobalt Iron Oxide
Sputtering Target Description
Lanthanum Strontium Cobalt Iron Oxide Sputtering Target is a specialized material used in the sputter deposition process. This compound is part of the family of perovskite oxides and is known for its applications in solid oxide fuel cells (SOFCs), oxygen permeation membranes, and other related fields.
Sputtering is a technique used to deposit thin films of material onto a substrate. It involves bombarding a target material with high-energy ions, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto the substrate, forming a thin film.
LSCF is a mixed metal oxide that combines lanthanum, strontium, cobalt, and iron in a specific ratio. The composition is designed to optimize its electronic and ionic conductivity, making it suitable for use in SOFCs where it can function as a cathode material.
Lanthanum Strontium Cobalt Iron Oxide
Sputtering Target Specifications
|
Compound Formula |
LaxSr1-xCoyFe1-yO3 |
|
Molecular Weight |
97.63 |
|
Appearance |
Gray Target |
|
Melting Point |
>1000℃ |
|
Density |
– |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Lanthanum Strontium Cobalt Iron Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for Lanthanum Strontium Cobalt Iron Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Lanthanum Strontium Cobalt Iron Oxide Sputtering Target Application
Lanthanum Strontium Cobalt Iron Oxide Sputtering Target is essential in the fabrication of materials for advanced energy and electronic devices.
Lanthanum Strontium Cobalt Iron Oxide Sputtering Target Packaging
Our Lanthanum Strontium Cobalt Iron Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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