Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Bismuth Vanadate Sputtering Targets, BiVO4
Bismuth Vanadate Sputtering
Targets Description
Bismuth Vanadate Sputtering Target is a specialized material used in a technique called sputter deposition. This process is a common method for depositing thin films of material onto a substrate in a controlled and precise manner.
Bismuth vanadate is a compound made up of bismuth (Bi), vanadium (V), and oxygen (O). It is known for its interesting optical and electronic properties, making it suitable for applications in areas such as solar energy conversion and photocatalysis.
Bismuth Vanadate Sputtering Targets Specifications
|
Compound Formula |
BiVO4 |
|
Molecular Weight |
323.92 |
|
Appearance |
Yellowish solid |
|
Melting Point |
N/A |
|
Density |
6.1 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Bismuth Vanadate Sputtering Targets Application
Bismuth Vanadate Sputtering Target is suitable for applications in areas such as solar energy conversion and photocatalysis.
Bismuth Vanadate Sputtering Targets Packaging
Our Bismuth Vanadate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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