Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Cobalt Iron Boron (Co/Fe/B) Sputtering Target
Cobalt Iron Boron (Co/Fe/B) Sputtering
Target Description
Cobalt Iron Boron (Co/Fe/B) Sputtering Target is made by combining cobalt, iron, and boron in the desired ratio and then compacting and sintering the mixture into a solid target form. The target is then mounted inside a sputtering system, where it is bombarded with high-energy ions to release atoms that deposit onto the substrate.
Sputtering is a process used in the deposition of thin films where atoms from a target material are ejected onto a substrate to form a film. In the case of CoFeB sputtering target, it is used to create thin film magnetic devices like magnetic tunnel junctions (MTJs), which are essential components in spintronics and magnetic storage devices.
Cobalt Iron Boron (Co/Fe/B) Sputtering Target Specifications
|
Compound Formula |
Co/Fe/B |
|
Appearance |
Metallic target |
|
Molecular Weight |
135.943 |
|
Density |
0.986 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Cobalt Iron Boron (Co/Fe/B) Sputtering Target Handling Notes
- Indium bonding is recommended for the Cobalt Iron Boron Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity, and is susceptible to thermal shock.
Cobalt Iron Boron (Co/Fe/B) Sputtering Target Application
Cobalt Iron Boron Sputter Target is commonly used for applications such as optical coatings, electronic devices, energy storage, and catalysts. The precise composition and manufacturing of the sputtering target ensure a uniform and controlled deposition process, resulting in high-quality thin films with desired properties.
Cobalt Iron Boron (Co/Fe/B) Sputtering Target Packaging
Our Co/Fe/B Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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