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Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


 

Indium Arsenide Sputtering Target

Description

 

Indium Arsenide Sputtering Targets, crafted from high-purity Indium Arsenide (InAs), find extensive use in both chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes. Leveraging the distinctive properties of Indium Arsenide, these targets play a pivotal role in semiconductor, microwave, and electrical applications.

Indium Arsenide (InAs) exhibits a conductivity level between that of a conductor and an insulator, embodying semiconductor properties. This versatile material has widespread applications in electronics and photonics and is instrumental in the preparation of semiconductor nanostructures.

With a direct energy gap, Indium Arsenide requires relatively small amounts of energy for electron and hole transitions, making it exceptional for optoelectronics. Devices like lasers and detectors benefit greatly from InAs’s direct energy gap. The high electron mobility of Indium Arsenide further enhances its utility in high-frequency and microwave devices.

Beyond its electronic prowess, Indium Arsenide proves thermally stable across a range of temperatures. Under specific conditions, it can even exhibit topological insulator properties, contributing to research in topological quantum computing.

 

 

Indium Arsenide Sputtering Target Specifications

Compound Formula

InAs

Molecular Weight

189.74

Appearance

Grey Target

Melting Point

942 °C

Density

5.67 g/cm3

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Indium Arsenide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Indium Arsenide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Indium Arsenide Sputtering Target Application

  1. Laser and detector preparation: Indium Arsenide Sputtering Targets are used for sputter deposition to prepare devices such as lasers and photodetectors.
  2. Semiconductor Device Preparation: In the semiconductor industry, Indium Arsenide Sputtering Targets are used in sputter deposition to prepare thin films for integrated circuits and other electronic devices.
  3. Microwave and RF devices: The high electron mobility of Indium Arsenide Sputtering Targets makes them very useful in high-frequency and microwave devices.
  4. Topological insulator research: Indium Arsenide Sputtering Targets have potential applications in topological physics research. Researchers use them to conduct experiments and exploration in the field of topological insulators.
  5. Energy storage applications: Indium Arsenide (InAs) is being studied as a material for metal halide sodium-ion batteries for energy storage applications.
  6. Semiconductor nanostructure preparation: Indium Arsenide Sputtering Targets can be used to prepare semiconductor nanostructures such as nanowires and nanodots for research and development of novel nanoelectronic devices.

 

Indium Arsenide Sputtering Target Packaging

Our Indium Arsenide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 


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