Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target
Description
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target refers to a material that is used in a process called sputtering. Sputtering is a technique used in the deposition of thin films onto a substrate. In this process, ions are bombarded onto a target material, causing the atoms from the target material to be ejected and deposited onto the substrate. By using a Permalloy sputtering target, thin films of Permalloy can be deposited onto a substrate to create magnetic components or enhance the magnetic properties of a device.
Permalloy is a type of magnetic material that is commonly used in various electronic devices and applications. It is made up of a combination of nickel (Ni), iron (Fe), molybdenum (Mo), and manganese (Mn) elements. These elements are mixed together in specific proportions to achieve the desired magnetic and electrical properties.
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Specifications
|
Compound Formula |
Ni/Fe/Mo/Mn |
|
Appearance |
gray metallic target |
|
Melting Point (℃) |
1395 |
|
Density |
8.7 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Handling Notes
- Indium bonding is recommended for Permalloy (Ni/Fe/Mo/Mn) Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity, and is susceptible to thermal shock.
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Application
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target is widely used in the manufacturing of magnetic sensors, magnetic recording heads, magnetic shielding, and other magnetic devices.
Permalloy (Ni/Fe/Mo/Mn) Sputtering Target Packaging
Our Permalloy (Ni/Fe/Mo/Mn) Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
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