메뉴 건너뛰기

MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Trusted expertise since 1990

35 years of development and manufacture of complex systems and components for multiple tasks

Gas Sources

Gas Sources

 

HABS Hydrogen Atom Beam Source

The Hydrogen Atom Beam Source HABS is a thermal gas cracker that produces an absolutely ion-free hydrogen gas beam, avoiding ion induced damage to the substrate.

HABS 40 Hydrogen atom Beam Source on DN40CF (O.D. 2.75") flange

 
  • H2 dissociation typically 80-98%, depending on operation conditions
  • Atomic hydrogen flux density up to 1*1016/(cm2 s)
  • No high-energy particles and ions
  • Low power consumption (P < 200 W)
  • Integrated water cooling, low thermal load on other experimental equipment
  • Integrated shutter optional
  • Additional customized aperture and leak valve available

 

 

OBS Oxygen Atom Beam Source

The Oxygen Atom Beam Source OBS is a thermal gas cracker that produces an ion-free oxygen gas beam, avoiding ion induced damage to the substrate.

OBS 40 Oxygen Atom Beam Source on DN40CF (O.D. 2.75") flange with aperture plate

 
  • O2 dissociation up to more than 80%, depending on operation conditions
  • Atomic oxygen flux density up to 1x1015/cm2 s
  • No high-energy particles and ions
  • Low power consumption
  • Integrated water cooling, low thermal load on other experimental equipment
  • Optional customized aperture 

 

 

FMP Flexible Microplasma Source


 
  • N2 + O2 version on DN40CF flange; DN63CF flange size with ion sensor option
  • Typical operation power and frequency: 5 - 20 W / 2.5 GHz
  • Typical gas flow : 1 to 10 sccm
  • Suitable for different gas types ( for example N2, H2 or O2)
  • Additional equipment / options: all-metal valve, gas supply, RF generator, ion sensor, photo diode

 

 

RF Plasma Source RFP


 

  • Nitride and Oxide MBE growth
  • UHV compatible construction for RF cavity operation
  • Customized aperture hole plate
  • Efficient water cooled coil, low thermal load on other experimental equipment
  • RF operation @ 13.56 MHz with Automatic RF tuning during operation
  • Optional shutter
  • Optional plasma emission monitoring

 

share
PVD Systems PVD 350 - PVD system for 100 mm wafers Deposition chamber of an Organic Deposition System Wafer-scale PVD system Research PVD system with
댓글 0
990
PVD Systems PVD 550 - PVD system for 300 mm wafers Wafer-scale PVD system Compact and versatile research PVD system with ultra-small footprint Depositi
댓글 0
1,096
MBE Components Effusion Cells Effusion Cells WEZ, Standard Effusion Cell WEZ Standard Effusion Cells are designed for evaporation
댓글 0
1,846
MBE Components E-Beam Evaporators E-Beam Evaporators EBV Standard Electron Beam Evaporator The Electron Beam Evaporator EBV intends to
댓글 0
1,292
MBE Components Substrate Manipulation Substrate Manipulation SH, Substrate Manipulators / Deposition Stages SH substrate manipulators are
댓글 0
1,113
MBE Components Valved Sources Valved Sources VACS Valved Arsenic Cracker Source The Valved Arsenic Cracker Source is designed for
댓글 0
1,084
MBE Components Dopant Cell Doping Cells DEZ Doping Effusion Cells DEZ 40-5-27 Doping Effusion Cell on DN40CF (O.D.2.75") flange
댓글 0
1,066
MBE Components Gas Sources Gas Sources HABS Hydrogen Atom Beam Source The Hydrogen Atom Beam Source HABS is a thermal gas crack
댓글 0
1,135
MBE Components Industrial MBE Sources PEZ-G Production Scale CIGS Evaporation Source PEZ-G Production Scale CIGS Evaporation Source Large
댓글 0
1,033
« 1 2 3 4 »
« 1 / 4 »
문의
하기