Strontium Fluoride Sputtering Target

Description

Strontium fluoride sputtering target is a type of fluoride ceramic sputtering target composed of strontium and fluorine.

Strontium is a chemical element that originated from Strontian, a small town in Scotland. It was first mentioned in 1787 and observed by W. Cruikshank. The isolation was later accomplished and announced by H. Davy. “Sr” is the canonical chemical symbol of strontium. Its atomic number in the periodic table of elements is 38 with a location at Period 5 and Group 2, belonging to the s-block. The relative atomic mass of strontium is 87.62(1) Dalton, the number in the brackets indicating the uncertainty.

Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.

Strontium Fluoride Sputtering Target Application

The strontium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Strontium Fluoride Sputtering Target Packing

Our strontium fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.