Praseodymium Fluoride Sputtering Target
Description
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. Praseodymium is often used in the production of magnets, lasers, and other technologies.
A sputtering target is a material used in a process called sputter deposition, which is a technique commonly employed in the manufacturing of thin films. Thin films find applications in various industries, including electronics, optics, and coatings. Sputtering is a physical vapor deposition (PVD) method where high-energy ions are used to dislodge atoms from a target material, and these atoms then deposit onto a substrate, forming a thin film.
Praseodymium Fluoride Sputtering Target Specifications
|
Compound Formula |
PrF3 |
|
Molecular Weight |
197.9 |
|
Appearance |
Green target |
|
Melting Point (℃) |
1395 |
|
Density (g/cm3) |
6.3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Praseodymium Fluoride Sputtering Target Handling Notes
- Indium bonding is recommended for Praseodymium Fluoride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Praseodymium Fluoride Sputtering Target Application
Praseodymium Fluoride Sputtering Target is used in sputter deposition processes to create thin films containing praseodymium fluoride. The use of praseodymium fluoride in thin films may have applications in optical coatings, sensors, and other electronic devices
Praseodymium Fluoride Sputtering Target Packaging
Our Praseodymium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.